Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization von Strahm, B., Howling, A.A., Sansonnens, L., Hollenstein, Ch, Kroll, U., Meier, J., Ellert, Ch, Feitknecht, L., Ballif, C.

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Multiple dehydrogenation reactions of negative ions in low pressure silane plasma chemistry von Howling, A A, Descoeudres, A, Hollenstein, Ch

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A double-ended helicon source to symmetrize RAID plasma von Jacquier, R., Agnello, R., Baquero-Ruiz, M., Bergerioux, H., Guittienne, Ph, Howling, A.A., Kadi, L., Karimov, R., Stollberg, C., Vincent, S., Furno, I.

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Reduction of the boron cross-contamination for plasma deposition of p–i–n devices in a single-chamber large area radio-frequency reactor von Ballutaud, J., Bucher, C., Hollenstein, Ch, Howling, A.A., Kroll, U., Benagli, S., Shah, A., Buechel, A.

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Cavity ring-down spectroscopy to measure negative ion density in a helicon plasma source for fusion neutral beams von Agnello, R., Barbisan, M., Furno, I., Guittienne, Ph, Howling, A. A., Jacquier, R., Pasqualotto, R., Plyushchev, G., Andrebe, Y., Béchu, S., Morgal, I., Simonin, A.

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Negative ion characterization in a helicon plasma source for fusion neutral beams by cavity ring-down spectroscopy and Langmuir probe laser photodetachment von Agnello, R., Béchu, S., Furno, I., Guittienne, Ph, Howling, A.A., Jacquier, R., Plyushchev, G., Barbisan, M., Pasqualotto, R., Morgal, I., Simonin, A.

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Gas breakdown mitigation in satellite slip rings von Avino, F., Martens, P., Howling, A.A., Bommottet, D., Furno, I.

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Spectroscopic characterization of H 2 and D 2 helicon plasmas generated by a resonant antenna for neutral beam applications in fusion von Marini, C., Agnello, R., Duval, B.P., Furno, I., Howling, A.A., Jacquier, R., Karpushov, A.N., Plyushchev, G., Verhaegh, K., Guittienne, Ph, Fantz, U., Wünderlich, D., Béchu, S., Simonin, A.

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RF bias to suppress post-oxidation of μc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna von Demolon, P., Guittienne, Ph, Howling, A.A., Jost, S., Jacquier, R., Furno, I.

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Non-intrusive plasma diagnostics for the deposition of large area thin film silicon von Howling, A.A., Strahm, B., Hollenstein, Ch

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Spectroscopic characterization of H2 and D2 helicon plasmas generated by a resonant antenna for neutral beam applications in fusion von Marini, C., Agnello, R., Duval, B.P., Furno, I., Howling, A.A., Jacquier, R., Karpushov, A.N., Plyushchev, G., Verhaegh, K., Guittienne, Ph, Fantz, U., Wünderlich, D., Béchu, S., Simonin, A.

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Electromagnetic sources of nonuniformity in large area capacitive reactors von Howling, A.A., Sansonnens, L., Hollenstein, Ch

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Nonuniform radio-frequency plasma potential due to edge asymmetry in large-area radio-frequency reactors von Howling, A. A., Sansonnens, L., Ballutaud, J., Hollenstein, Ch, Schmitt, J. P. M.

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Optimization of the microcrystalline silicon deposition efficiency von Strahm, B., Howling, A. A., Sansonnens, L., Hollenstein, Ch

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Input silane concentration effect on the a-Si:H to μ c - Si : H transition width von Feltrin, A., Strahm, B., Bugnon, G., Sculati-Meillaud, F., Ballif, C., Howling, A.A., Hollenstein, Ch

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Probe measurements of plasma potential nonuniformity due to edge asymmetry in large-area radio-frequency reactors: The telegraph effect von Howling, A. A., Derendinger, L., Sansonnens, L., Schmidt, H., Hollenstein, Ch, Sakanaka, E., Schmitt, J. P. M.

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Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity von Sansonnens, L., Schmidt, H., Howling, A. A., Hollenstein, Ch, Ellert, Ch, Buechel, A.

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Comment on "Ion energy uniformity in high-frequency capacitive discharges" [ Appl. Phys. Lett. 86 , 021501 ( 2005 ) ] von Howling, A. A., Sansonnens, L., Schmidt, H., Hollenstein, Ch

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Rapid deposition of hydrogenated microcrystalline silicon by a high current DC discharge von Franz, D., Grangeon, F., Delachaux, T., Howling, A.A., Hollenstein, Ch, Karner, J.

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Power laws for the spatial dependence of electrical parameters in the high-voltage capacitive RF sheath von Muller, H., Howling, A.A., Hollenstein, C.

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