Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique von Purandare, Yashodhan P., Ehiasarian, Arutiun P., Eh Hovsepian, Papken

Volltext

Lubricated sliding wear mechanism of chromium-doped graphite-like carbon coating von Mandal, Paranjayee, Ehiasarian, Arutiun P., Hovsepian, Papken Eh

Volltext

Effect of substrate bias voltage on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings von Biswas, Barnali, Purandare, Yashodhan, Khan, Imran, Hovsepian, Papken Eh

Volltext

Effect of nitriding voltage on the impact load fatigue and fracture toughness behaviour of CoCrMo alloy nitrided utilising a HIPIMS discharge von Shukla, Krishnanand, Purandare, Yashodhan P., Khan, Imran, Ehiasarian, Arutiun P., Hovsepian, Papken E.H.

Volltext

Effect of chamber pressure on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings von Biswas, Barnali, Purandare, Y., Sugumaran, A., Khan, Imran, Hovsepian, Papken Eh

Volltext

Low pressure plasma nitrided CoCrMo alloy utilising HIPIMS discharge for biomedical applications von Shukla, Krishnanand, Sugumaran, Arunprabhu A., Khan, Imran, Ehiasarian, Arutiun P., Hovsepian, Papken Eh

Volltext

Isothermal and dynamic oxidation behaviour of Mo–W doped carbon-based coating von Mandal, Paranjayee, Ehiasarian, Arutiun P., Hovsepian, Papken Eh

Volltext

Friction and wear behaviour of Mo–W doped carbon-based coating during boundary lubricated sliding von Hovsepian, Papken Eh, Mandal, Paranjayee, Ehiasarian, Arutiun P., Sáfrán, G., Tietema, R., Doerwald, D.

Volltext

Complementary Metal–Oxide–Semiconductor Compatible Deposition of Nanoscale Transition-Metal Nitride Thin Films for Plasmonic Applications von Bower, Ryan, Loch, Daniel A. L, Ware, Ecaterina, Berenov, Andrey, Zou, Bin, Hovsepian, Papken Eh, Ehiasarian, Arutiun P, Petrov, Peter K

Volltext

Tribological behaviour of Mo–W doped carbon-based coating at ambient condition von Mandal, Paranjayee, Ehiasarian, Arutiun P., Hovsepian, Papken Eh

Volltext

Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films von Hovsepian, Papken Eh, Sugumaran, Arunprabhu A., Purandare, Yashodhan, Loch, Daniel A.L., Ehiasarian, Arutiun P.

Volltext

Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique von Reinhard, Christina, Ehiasarian, Arutiun P., Hovsepian, Papken Eh

Volltext

VmeCN Based Nanoscale Multilayer PVD Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technology von Hovsepian, Papken Eh, Ehiasarian, Arutiun P., Deeming, Anthony, Schimpf, Christian

Volltext

Effect of High Ion Irradiation on the Structure, Properties and High Temperature Tribology of Nanoscale CrAlYN/CrN Multilayer Coating Deposited by HIPIMS-HIPIMS Technique von Hovsepian, Papken Eh, Ehiasarian, Arutiun P., Purandare, Yashodhan P., Braun, Reinhold, Ross, Ian M.

Volltext

Structure and Wear Mechanisms of Nanostructured TiAlCN/VCN Multilayer Coatings von Luo, Quanshun, Schimpf, Christian, Ehiasarian, Arutian P., Chen, Linghao, Hovsepian, Papken Eh

Volltext

Transition metal nitride thin films deposited at CMOS compatible temperatures for tunable optoelectronic and plasmonic devices von Bower, Ryan, Loch, Daniel A. L, Berenov, Andrey, Zou, Bin, Hovsepian, Papken Eh, Ehiasarian, Arutiun P, Petrov, Peter K

Volltext bestellen

Transition metal nitride thin films deposited at CMOS compatible temperatures for tunable optoelectronic and plasmonic devices von Bower, Ryan, Loch, Daniel A L, Berenov, Andrey, Zou, Bin, Papken Eh Hovsepian, Ehiasarian, Arutiun P, Petrov, Peter K

Volltext

PVD-VERFAHREN ZUR BESCHICHTUNG VON SUBSTRATEN MITTELS MAGNETRON KATHODENZERSTÄUBUNG von HOVSEPIAN, PAPKEN EH, MUENZ, WOLF-DIETER, DR, EHIASARIAN, ARUTIUN P

Volltext bestellen

PVD coating process magnetron cathodic sputtering von HOVSEPIAN, PAPKEN EH, MUENZ, WOLF-DIETER, DR, EHIASARIAN, ARUTIUN P

Volltext bestellen

Combined coating process using high-rate magnetic field assisted sputtering and unbalanced magnetron von HOVSEPIAN, PAPKEN EH, MUENZ, WOLF-DIETER, DR, EHIASARIAN, ARUTIUN P

Volltext bestellen