Hetero- and homogeneous three-dimensional hierarchical tungsten oxide nanostructures by hot-wire chemical vapor deposition von Houweling, Z.S., Harks, P.-P.R.M.L., Kuang, Y., van der Werf, C.H.M., Geus, J.W., Schropp, R.E.I.

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The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD von Verlaan, V., Verkerk, A.D., Arnoldbik, W.M., van der Werf, C.H.M., Bakker, R., Houweling, Z.S., Romijn, I.G., Borsa, D.M., Weeber, A.W., Luxembourg, S.L., Zeman, M., Dekkers, H.F.W., Schropp, R.E.I.

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Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD von Verlaan, V., Houweling, Z.S., van der Werf, C.H.M., Romijn, I.G., Weeber, A.W., Goldbach, H.D., Schropp, R.E.I.

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Strengthening ultrathin Si3N4 membranes by compressive surface stress von Shafikov, A., Schurink, B., van de Kruijs, R.W.E., Benschop, J., van den Beld, W.T.E., Houweling, Z.S., Bijkerk, F.

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Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cells von Schropp, R.E.I., Franken, R.H., Goldbach, H.D., Houweling, Z.S., Li, H., Rath, J.K., Schüttauf, J.W.A., Stolk, R.L., Verlaan, V., van der Werf, C.H.M.

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Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes von Shafikov, A., van de Kruijs, R.W.E., Benschop, J.P.H., Schurink, B., van den Beld, W.T.E., Houweling, Z.S., Kooi, B.J., Ahmadi, M., de Graaf, S., Bijkerk, F.

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Nanorod solar cell with an ultrathin a-Si:H absorber layer von Kuang, Y, van der Werf, C.H.M, Houweling, Z.S, Schropp, R.E.I

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Formation of isolated carbon nanofibers with hot-wire CVD using nanosphere lithography as catalyst patterning technique von Houweling, Z.S., Verlaan, V., ten Grotenhuis, G.T., Schropp, R.E.I.

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Formation of isolated carbon nanofibers with hot-wire CVD using nanosphere lithography as catalyst patterning technique von Houweling, Z.S, Verlaan, V, ten Grotenhuis, G.T, Schropp, R.E.I

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Substrate patterning with NiOx nanoparticles and hot-wire chemical vapour deposition of WO3x and carbon nanostructures von Houweling, Z.S

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Multi-crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot-wire CVD silicon nitride as antireflection coating von Verlaan, V., van der Werf, C. H. M., Houweling, Z. S., Romijn, I. G., Weeber, A. W., Dekkers, H. F. W., Goldbach, H. D., Schropp, R. E. I.

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Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon von van der Werf, C.H.M., Li, H., Verlaan, V., Oliphant, C.J., Bakker, R., Houweling, Z.S., Schropp, R.E.I.

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High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition von Verlaan, V., Bakker, R., van der Werf, C.H.M., Houweling, Z.S., Mai, Y., Rath, J.K., Schropp, R.E.I.

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Effect of ammonia on Ta filaments in the hot wire CVD process von Verlaan, V, van der Werf, C.H.M, Oliphant, C.J, Bakker, R, Houweling, Z.S, Schropp, R.E.I

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Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon von van der Werf, C.H.M, Li, H. B. T, Verlaan, V, Oliphant, C.J, Bakker, R, Houweling, Z.S, Schropp, R.E.I

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Effect of ammonia on Ta filaments in the hot wire CVD process von Verlaan, V., van der Werf, C.H.M., Oliphant, C.J., Bakker, R., Houweling, Z.S., Schropp, R.E.I.

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Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD von Verlaan, V, Houweling, Z.S, van der Werf, C.H.M, Romijn, I.G, Schropp, R.E.I, Goldbach, H.D

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All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s) von Schropp, R.E.I., Nishizaki, S., Houweling, Z.S., Verlaan, V., van der Werf, C.H.M., Matsumura, H.

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Bonding rearrangement in amorphous silicon nitrides deposited by hot-wire chemical vapor deposition upon thermal annealing von Mai, Y, Verlaan, V, van der Werf, C.H.M, Houweling, Z.S, Bakker, R, Rath, J.K, Schropp, R.E.I

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The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD von Dekkers, H.F.W, Zeman, M, Verlaan, V, Verkerk, A.D, Arnoldbik, W.M, van der Werf, C.H.M, Bakker, R, Houweling, Z.S, Romijn, I.G, Borsa, D.M, Luxembourg, S.L, Schropp, R.E.I

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