Probing the reaction mechanism between a laser welded polyamide thin film and titanium with XPS and ToF-SIMS von Hirchenhahn, P., Al Sayyad, A., Bardon, J., Plapper, P., Houssiau, L.

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Highlighting Chemical Bonding between Nylon-6.6 and the Native Oxide from an Aluminum Sheet Assembled by Laser Welding von Hirchenhahn, P, Al Sayyad, A, Bardon, J, Felten, A, Plapper, P, Houssiau, L

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Diffusion at the interface of laser welded polyamide-6.6 and aluminum assemblies von Hirchenhahn, P., Al-Sayyad, A., Bardon, J., Plapper, P., Houssiau, L.

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Molecular depth profiling of organic photovoltaic heterojunction layers by ToF-SIMS: comparative evaluation of three sputtering beams von Mouhib, T, Poleunis, C, Wehbe, N, Michels, J J, Galagan, Y, Houssiau, L, Bertrand, P, Delcorte, A

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Plasma polymerization chemistry of unsaturated hydrocarbons: neutral species identification by mass spectrometry von Gillon, X, Houssiau, L

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Investigation of some physical properties of pure and Co-doped MoO3 synthesized on glass substrates by the spray pyrolysis method von Benameur, N., Chakhoum, M.A., Boukhachem, A., Dahamni, M.A., Ghamnia, M., Hacini, N., Pireaux, J.-P., Houssiau, L., Ziouche, A.

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Molecular depth profiling of polymers with very low energy reactive ions von Houssiau, L., Mine, N.

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Molecular depth profiling with reactive ions, or why chemistry matters in sputtering von Houssiau, L., Mine, N.

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Molecular depth profiling of polymers with very low energy ions von Houssiau, L., Douhard, B., Mine, N.

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First in situ Optical Emission Spectroscopy measurements during cesium low-energy depth profiling von Mine, N., Houssiau, L.

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Metal-Assisted Secondary Ion Mass Spectrometry Using Atomic (Ga+, In+) and Fullerene Projectiles von Delcorte, A, Yunus, S, Wehbe, N, Nieuwjaer, N, Poleunis, C, Felten, A, Houssiau, L, Pireaux, J.-J, Bertrand, P

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Comparison of fullerene and large argon clusters for the molecular depth profiling of amino acid multilayers von Wehbe, N., Mouhib, T., Delcorte, A., Bertrand, P., Moellers, R., Niehuis, E., Houssiau, L.

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Molecular depth profiling of model biological films using low energy monoatomic ions von Brison, J., Mine, N., Wehbe, N., Gillon, X., Tabarrant, T., Sporken, R., Houssiau, L.

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Investigation of Cs surface layer formation in Cs-SIMS with TOF-MEIS and SIMS von Houssiau, L., Noël, C., Mine, N., Jung, K. W., Min, W. J., Moon, D. W.

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TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Ar+n, C+60 and Cs+ sputtering ions: A comparative study von WEHBE, N, TABARRANT, T, BRISON, J, MOUHIB, T, DELCORTE, A, BERTRAND, P, MOELLERS, R, NIEHUIS, E, HOUSSIAU, L

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TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions: A comparative study von Wehbe, N., Tabarrant, T., Brison, J., Mouhib, T., Delcorte, A., Bertrand, P., Moellers, R., Niehuis, E., Houssiau, L.

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MCsn+ cluster formation on organic surfaces: A novel way to depth-profile organics? von Mine, N., Douhard, B., Houssiau, L.

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Depth distribution of Cs implanted into Si at steady-state during dual beam ToF-SIMS profiling von Vitchev, R.G., Brison, J., Houssiau, L.

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Metal-assisted SIMS and cluster ion bombardment for ion yield enhancement von Heile, A., Lipinsky, D., Wehbe, N., Delcorte, A., Bertrand, P., Felten, A., Houssiau, L., Pireaux, J.-J., De Mondt, R., Van Vaeck, L., Arlinghaus, H.F.

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Cesium redeposition artifacts during low energy ToF-SIMS depth profiling von Vitchev, R.G., Brison, J., Houssiau, L.

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