Simulation study of total ionizing dose effect of gamma radiation on 15 nm bulk FinFET von Fan, J.Q., Hou, T.H., Zhao, Q., Zhang, F., Li, K., Fang, J., Hao, J.H., Dong, Z.W.

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Thermally-enhanced remote plasma nitrided ultrathin (1.65 nm) gate oxide with excellent performances in reduction of leakage current and boron diffusion von Chen, C.H., Fang, Y.K., Yang, C.W., Ting, S.F., Tsair, Y.S., Yu, M.C., Hou, T.H., Wang, M.F., Chen, S.C., Yu, C.H., Liang, M.S.

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Hygrothermal aging of composite single lap shear specimens comprised of AF-555M adhesive and T800H/3900-2 adherends von Knight, G.A., Hou, T.H., Belcher, M.A., Palmieri, F.L., Wohl, C.J., Connell, J.W.

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Double-vacuum-bag technology for volatile management in composite fabrication von Hou, T.H., Jensen, B.J.

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Composite-to-composite Bonding using Scotch-Weld TM AF-555M Structural Adhesive von Hou, T.H., Boston, K.G., Baughman, J.M., Walker, S., Johnston, W.M.

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Composite-to-composite Bonding using Scotch-WeldTM AF-555M Structural Adhesive von Hou, T.H., Boston, K.G., Baughman, J.M., Walker, S., Johnston, W.M.

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Social intelligence in digital library guide designers von Hou, H.Y., Hou, T.H., Hu, H.J.

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Evaluation of separator performance by number-size distribution data von Hou, T.H.

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HfO 2 /HfSi x O y high-K gate stack with very low leakage current for low-power poly-Si gated CMOS application von Yang, C.W., Fang, Y.K., Chen, S.F., Wang, M.F., Hou, T.H., Lin, Y.M., Yao, L.G., Chen, S.C., Liang, M.S.

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Improved current drivability and poly-gate depletion of submicron PMOSFET with poly-SiGe gate and ultra-thin nitride gate dielectric von Chen, C.H., Fang, Y.K., Yang, C.W., Ting, S.F., Tsair, Y.S., Chang, C.N., Hou, T.H., Wang, M.F., Yu, M.C., Lin, C.L., Chen, S.C., Yu, C.H., Liang, M.S.

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IM7/LARCTM-ITPI polyimide composites von Hou, T.H., Siochi, E.J., Johnston, N.J., St.Clair, T.L.

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IM7/LARC TM-ITPI polyimide composites von Hou, T.H., Siochi, E.J., Johnston, N.J., St.Clair, T.L.

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Ultrathin ox/nitride gate stack for sub-quarter-micron CMOS devices prepared by RTCVD von Wang, M.F., Chen, C.H., Yu, M.C., Hou, T.H., Lin, Y.M., Chcn, S.C., Fang, Y.K., Yu, C.H., Liang, M.S.

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Base oxide scaling limit of thermally-enhanced remote plasma nitridation (TE-RPN) process for ultra-thin gate dielectric formation von Yu, M.C., Huang, H.T., Chen, C.H., Wang, M.F., Hou, T.H., Lin, Y.M., Jang, S.M., Diaz, C.H., Sun, J., Fang, Y.K., Chen, S.C., Yu, C.H., Liang, M.S.

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Thermal and Rheological Properties of LaRC-TPI 1500 Series Polymers von Hou, T.H., Bai, J.M.

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Effects of base oxide in HfSiO/SiO/sub 2/ high-k gate stacks von Wu, W.H., Chen, M.C., Wang, M.F., Hou, T.H., Yao, L.G., Jin, Y., Chen, S.C., Liang, M.S.

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CT-based radiomic signature predicts distant metastasis in lung adenocarcinoma von Coroller, Thibaud P, Grossmann, Patrick, Hou, Ying, Rios Velazquez, Emmanuel, Leijenaar, Ralph T.H, Hermann, Gretchen, Lambin, Philippe, Haibe-Kains, Benjamin, Mak, Raymond H, Aerts, Hugo J.W.L

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The Third Fermi Large Area Telescope Catalog of Gamma-Ray Pulsars von Ajello, M., Bailes, M., Gonzalez, J. Becerra, Berretta, A., Bhattacharyya, B., Bonino, R., Bruel, P., Burnett, T. H., Camilo, F., Caputo, R., Caraveo, P. A., Chiaro, G., Cognard, I., Orestano, P. Cristarella, Cuoco, A., Cutini, S., De Gaetano, S., de Menezes, R., de Palma, F., Di Lalla, N., Domínguez, A., Fegan, S. J., Ferrara, E. C., Fiori, A., Fleischhack, H., Flynn, C., Franckowiak, A., Freire, P. C. C., Fukazawa, Y., Fusco, P., Gasparrini, D., Giacchino, F., Giglietto, N., Giroletti, M., Grenier, I. A., Guillemot, L., Guiriec, S., Gustafsson, M., Harding, A. K., Hays, E., Hewitt, J. W., Horan, D., Jankowski, F., Johnson, T. J., Johnston, S., Kataoka, J., Kramer, M., Latronico, L., Lee, S.-H., Limyansky, B., Longo, F., Loparco, F., Lorusso, L., Lubrano, P., Lyne, A. G., Maan, Y., Manfreda, A., Marelli, M., Martí-Devesa, G., Mazziotta, M. N., Mereu, I., Mitthumsiri, W., Moiseev, A. A., Monzani, M. E., Morselli, A., Nuss, E., Orienti, M., Orlando, E., Panzarini, G., Parthasarathy, A., Persic, M., Pesce-Rollins, M., Pillera, R., Porter, T. A., Possenti, A., Principe, G., Ransom, S. M., Ray, P. S., Razzaque, S., Reimer, O., Renault-Tinacci, N., Parkinson, P. M. Saz, Serini, D., Sgrò, C., Sharma, V., Spandre, G., Stappers, B. W., Stephens, T. E., Suson, D. J., Tabassum, S., Tajima, H., Thompson, D. J., Tibolla, O., Torres, D. F., Wadiasingh, Z., Wang, N., Wang, P., Weltevrede, P., Zaharijas, G., Zhu, W.

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Microstructural evolution and wear behavior of friction stir processed L12 strengthened AlFeCrCuNi-type high-entropy alloy von Huang, G.Q., Sun, T., Meng, F.Q., Jiang, X.W., Chou, T.H., Ju, J., Gan, J., Yang, T., Li, M.S., Shen, Z.K., Hou, W.T., Piao, Z.Y., Mironov, S., Feng, X.M., Shen, Y.F.

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A patient‐oriented, general‐practitioner‐level, deep‐learning‐based cutaneous pigmented lesion risk classifier on a smartphone von Chin, Y.P.H., Hou, Z.Y., Lee, M.Y., Chu, H.M., Wang, H.H., Lin, Y.T., Gittin, A., Chien, S.C., Nguyen, P.A., Li, L.C., Chang, T.H., Li, Y.C.J.

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