A review of tin (II) monosulfide and its potential as a photovoltaic absorber von Banai, R.E., Horn, M.W., Brownson, J.R.S.

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Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer-Scale Spacings Created by Molecular Rulers von Anderson, M. E., Mihok, M., Tanaka, H., Tan, L.-P., Horn, M. W., McCarty, G. S., Weiss, P. S.

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Low temperature charge carrier hopping transport mechanism in vanadium oxide thin films grown using pulsed dc sputtering von Bharadwaja, S. S. N., Venkatasubramanian, C., Fieldhouse, N., Ashok, S., Horn, M. W., Jackson, T. N.

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The ultimate in real-time ellipsometry: Multichannel Mueller matrix spectroscopy von Chen, Chi, Horn, M.W., Pursel, Sean, Ross, C., Collins, R.W.

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Electrical and optical properties of sputtered amorphous vanadium oxide thin films von Podraza, N. J., Gauntt, B. D., Motyka, M. A., Dickey, E. C., Horn, M. W.

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Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering von Motyka, M. A., Gauntt, B. D., Horn, M. W., Dickey, E. C., Podraza, N. J.

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Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps von Anderson, M.E., Srinivasan, Charan, Jayaraman, Raviprakesh, Weiss, P.S., Horn, M.W.

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Growth of sculptured polymer submicronwire assemblies by vapor deposition von Pursel, Sean, Horn, Mark W., Demirel, Melik C., Lakhtakia, Akhlesh

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Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering von Fieldhouse, N., Pursel, S. M., Carey, R., Horn, M. W., Bharadwaja, S. S. N.

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Analysis of Si1-xGex: H thin films with graded composition and structure by real time spectroscopic ellipsometry von PODRAZA, N. J, JING LI, WRONSKI, C. R, DICKEY, E. C, HORN, M. W, COLLINS, R. W

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Rigorous electromagnetic modeling of near-field phase-shifting contact lithography von Wang, Fei, Horn, Mark W, Lakhtakia, Akhlesh

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Analysis of Si1-x Gex:H thin films with graded composition and structure by real time spectroscopic ellipsometry von Podraza, N. J., Li, Jing, Wronski, C. R., Dickey, E. C., Horn, M. W., Collins, R. W.

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Phase Control of RF Sputtered SnS^sub x^ with Post-Deposition Annealing for a Pseudo-Homojunction Photovoltaic Device von Nasr, J R, Cordell, J J, Gurunathan, R L, Brownson, J R, S, Horn, M W

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A new method for measuring thermal conductivity of thin films von Govorkov, S., Ruderman, W., Horn, M. W., Goodman, R. B., Rothschild, M.

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Amorphous carbon films as planarization layers deposited by plasma-enhanced chemical vapor deposition von Pang, S.W., Horn, M.W.

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Control of Phase in Tin Sulfide Thin Films Produced via RF-Sputtering of SnS2 Target with Post-deposition Annealing von Banai, R.E., Cordell, J.C., Lindwall, G., Tanen, N.J., Shang, S.-L., Nasr, J.R., Liu, Z.-K., Brownson, J.R. S., Horn, M.W.

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Phase Control of RF Sputtered SnSx with Post-Deposition Annealing for a Pseudo-Homojunction Photovoltaic Device von Nasr, J. R., Cordell, J. J., Gurunathan, R. L., Brownson, J. R. S., Horn, M. W.

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Dry-developed organosilicon resists for 193-nm excimer laser lithography von Kunz, R. R., Horn, M. W.

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Permeation of hydrogen into silicon during low-energy hydrogen ion beam bombardment von HORN, M. W, HEDDLESON, J. M, FONASH, S. J

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Ion implantation studies on VO(x) films prepared by pulsed dc reactive sputtering von Venkatasubramanian, C, Horn, M W, Ashok, S

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