Electroreflectance spectroscopy study of hydrogen plasma immersion ion implanted silicon with ultrathin oxide film von Alexandrova, S, Szekeres, A, Holiney, R Yu, Matveeva, L

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Growth of III–V semiconductor layers on Si patterned substrates von Gorbach, T.Ya, Holiney, R.Yu, Matveeva, L.A, Smertenko, P.S, Svechnikov, S.V, Venger, E.F, Ciach, R, Faryna, M

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Electroreflectance of porous layers obtained by stain etching of laser modified silicon von Holiney, R Yu, Fedorenko, L L, Matveeva, L A, Strilchenko, I Yu, Venger, E F, Yusupov, N M

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Electroreflectance study of macroporous silicon surfaces von Holiney, R.Yu, Matveeva, L.A, Venger, E.F, Livinenko, A.O, Karachevtseva, L.A

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Raman Spectroscopy and Electroreflectance Studies of Self-Assembled SiGe Nanoislands Grown at Various Temperatures von Valakh, M. Ya

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The influence of hydrogen plasma on the electroreflectance spectrum and the spectrum of electron states of porous silicon von Venger, E. F., Holiney, R. Yu, Matveeva, L. A., Vasin, A. V.

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Effect of the Si wafer pretreatment on the patterned substrate morphology and growth of Hg1-xCdxTe PLD films von GORBACH, T. Ya, HOLINEY, R. Yu, MATVEEVA, L. A, SVECHNIKOV, S. V, VENGER, E. F, KUZMA, M, WISZ, G

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Electroreflectance spectroscopy and scanning electron microscopy study of microrelief silicon wafers with various surface pretreatments von Gorbach, T.Ya, Holiney, R.Yu, Matiyuk, I.M., Matveeva, L.A., Svechnikov, S.V., Venger, E.F.

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