Integration of EBDW of one entire metal layer as substitution for optical lithography in 220 nm node microcontrollers von KRETZ, J, ROEPER, H, SCHWERDTFEGER, I, THRUM, F, VENNEKAMP, M, ARNDT, C, BISCHOFF, T, CHOI, K.-H, GOLDBECK, G, GUNIA, M, HOHLE, C, LUTZ, T, SCHUBERT, U

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Determination of proximity effect parameters by means of CD-linearity in sub 100 nm electron beam lithography von Hauptmann, M., Choi, K.-H., Jaschinsky, P., Hohle, C., Kretz, J., Eng, L.M.

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Correlation between Dispersivity of Charge Transport and Holographic Response Time in an Organic Photorefractive Glass von Hofmann, U, Grasruck, M, Leopold, A, Schreiber, A, Schloter, S, Hohle, C, Strohriegl, P, Haarer, D, Zilker, S. J

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Holographic and photoelectric characterization of a novel photorefractive organic glass von Schloter, S., Schreiber, A., Grasruck, M., Leopold, A., Kol'chenko, M., Pan, J., Hohle, C., Strohriegl, P., Zilker, S.J., Haarer, D.

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CD control of direct versus complementary exposure for shaped beam writers and its correlation to the local registration error von Thrum, F., Choi, K.-H., Lutz, T., Hohle, C., Arndt, C., Tesauro, M., Bootsmann, M.-T., Kretz, J.

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Dispersive hole transport in organic photorefractive glasses von Grasruck, M., Schreiber, A., Hofmann, U., Zilker, S. J., Leopold, A., Schloter, S., Hohle, C., Strohriegl, P., Haarer, D.

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15 days electron beam exposure for manufacturing of large area silicon based NIL master von Thrun, X, Choi, K-H, Freitag, M, Gutsch, M, Hohle, C, Paul, J, Rudolph, M, Steidel, K

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Characterization of charge generation and transport in a photorefractive organic glass: comparison between conventional and holographic time-of-flight experiments von Zilker, S.J, Grasruck, M, Wolff, J, Schloter, S, Leopold, A, Kol'chenko, M.A, Hofmann, U, Schreiber, A, Strohriegl, P, Hohle, C, Haarer, D

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High Resolution Patterning for Sub 30 nm Technology Nodes Using a Ceramic Based Dual Hard Mask von Paul, Jan, Rudolph, Matthias, Riedel, Stefan, Thrun, Xaver, Beyer, Volkhard, Wege, Stephan, Hohle, Christoph

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Photorefractive triphenylamine-based glass: a multifunctional low molecular weight compound with fast holographic response von Hohle, C., Hofmann, U., Schloter, S., Thelakkat, M., Strohriegl, P., Haarer, D., Zilker, S. J.

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Novel low-molar-mass glasses for photorefractive and electroluminescent applications von Hohle, C., Jandke, M., Schloter, S., Koch, N., Resel, R., Haarer, D., Strohriegl, P.

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Explaining Routinized Decision Making: A Review of Theories and Models von Betsch, Tilmann, Haberstroh, Susanne, Hohle, Cornelia

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Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications von Hohle, C., Arndt, C., Choi, K.-H., Kretz, J., Lutz, T., Thrum, F., Keil, K.

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Novel functional materials based on triarylamines–synthesis and application in electroluminescent devices and photorefractive systems von Thelakkat, Mukundan, Schmitz, Christoph, Hohle, Christoph, Strohriegl, Peter, Schmidt, Hans-Werner, Hofmann, Uwe, Schloter, Stefan, Haarer, Dietrich

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High-level expression of biologically active bovine alpha interferon by Bovine herpesvirus 1 interferes only marginally with recombinant virus replication in vitro von Hohle, C, Karger, A, Konig, P, Giesow, K, Keil, G.M

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Integration of EBDW of one entire metal layer as substitution for optical lithography in 220nm node microcontrollers von Kretz, J., Roeper, H., Arndt, C., Bischoff, T., Choi, K.-H., Goldbeck, G., Gunia, M., Hohle, C., Lutz, T., Schubert, U., Schwerdtfeger, I., Thrum, F., Vennekamp, M.

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Engineering Glycoprotein B of Bovine Herpesvirus 1 To Function as Transporter for Secreted Proteins: a New Protein Expression Approach von KEIL, Günther M, HÖHLE, Constanze, GIESOW, Katrin, KÖNIG, Patricia

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Efficient Synthesis of a Multifunctional Dye Conjugate for Photorefractive Applications von Yao, Sheng, Hohle, Christoph, Strohriegl, Peter, Würthner, Frank

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Chemically Amplified Main Chain Scission: New Concept to Reduce Line Edge Roughness and Outgassing von Eschbaumer, Christian, Heusinger, Nicole, Hohle, Christoph, Sebald, Michael

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Chemically Amplified Main Chain Scission: Chopping the Influence of Polymer Dimensions on Line Edge Roughness von Eschbaumer, Christian, Heusinger, Nicole, Kern, Marion, Jutgla, Angela, Hohle, Christoph, Sebald, Michael

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