Influence of Low Pressures on the Performance of Lithium Ion Batteries for Airplane Applications von Hoenicke, P., Khatri, R., Bauer, C., Osama, M., Kallo, J., Willich, C.

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Grazing incidence x-ray fluorescence and secondary ion mass spectrometry combined approach for the characterization of ultrashallow arsenic distribution in silicon von Pepponi, G., Giubertoni, D., Bersani, M., Meirer, F., Ingerle, D., Steinhauser, G., Streli, C., Hoenicke, P., Beckhoff, B.

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In-line characterization of ultrathin transition metal dichalcogenides using X-ray fluorescence and X-ray photoelectron spectroscopy von Nolot, E., Cadot, S., Martin, F., Hönicke, P., Zech, C., Beckhoff, B.

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The anisotropy in the optical constants of quartz crystals for soft X‐rays von Andrle, A., Hönicke, P., Vinson, J., Quintanilha, R., Saadeh, Q., Heidenreich, S., Scholze, F., Soltwisch, V.

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A novel instrument for quantitative nanoanalytics involving complementary X-ray methodologies von Lubeck, J., Beckhoff, B., Fliegauf, R., Holfelder, I., Hönicke, P., Müller, M., Pollakowski, B., Reinhardt, F., Weser, J.

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Experimental determination of the oxygen K-shell fluorescence yield using thin SiO2 and Al2O3 foils von Hönicke, P., Kolbe, M., Krumrey, M., Unterumsberger, R., Beckhoff, B.

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GIXRF In The Soft X-Ray Range Used For The Characterization Of Ultra Shallow Junctions von Beckhoff, B, Hoenicke, P, Giubertoni, D, Pepponi, G, Bersani, M

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Experimental determination of the x-ray atomic fundamental parameters of nickel von Ménesguen, Y, Lépy, M-C, Hönicke, P, Müller, M, Unterumsberger, R, Beckhoff, B, Hoszowska, J, Dousse, J-Cl, B achucki, W, Ito, Y, Yamashita, M, Fukushima, S

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Theoretical and experimental determination of K - and L -shell x-ray relaxation parameters in Ni von Guerra, M., Sampaio, J. M., Parente, F., Indelicato, P., Hönicke, P., Müller, M., Beckhoff, B., Marques, J. P., Santos, J. P.

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A combined experimental and theoretical approach to determine X‐ray atomic fundamental quantities of tin von Ménesguen, Y., Lépy, M.‐C., Sampaio, J. M., Marques, J. P., Parente, F., Guerra, M., Indelicato, P., Santos, J. P., Hönicke, P., Beckhoff, B.

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Multi-technique characterization of arsenic ultra shallow junctions in silicon within the ANNA consortium von Giubertoni, D, Pepponi, G, Beckhoff, B, Hoenicke, P, Gennaro, S, Meirer, F, Ingerle, D, Steinhauser, G, Fried, M, Petrik, P, Parisini, A, Reading, M A, Streli, C, Van Den Berg, J A, Bersani, M

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Focusing of soft X-ray radiation and characterization of the beam profile enabling X-ray emission spectrometry at nanolayered specimens von Unterumsberger, R., Müller, M., Beckhoff, B., Hönicke, P., Pollakowski, B., Bjeoumikhova, S.

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Thermal stability and relaxation mechanisms in compressively strained Ge0.94Sn0.06 thin films grown by molecular beam epitaxy von Fleischmann, C., Lieten, R. R., Hermann, P., Hönicke, P., Beckhoff, B., Seidel, F., Richard, O., Bender, H., Shimura, Y., Zaima, S., Uchida, N., Temst, K., Vandervorst, W., Vantomme, A.

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Characterization of ultra-shallow aluminum implants in silicon by grazing incidence and grazing emission X-ray fluorescence spectroscopy von Hönicke, P, Kayser, Y, Beckhoff, B, Müller, M, Dousse, J.-Cl, Hoszowska, J, Nowak, S. H

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Grazing angle X-ray fluorescence from periodic structures on silicon and silica surfaces von Nowak, S.H., Banaś, D., Błchucki, W., Cao, W., Dousse, J.-Cl, Hönicke, P., Hoszowska, J., Jabłoński, Ł., Kayser, Y., Kubala-Kukuś, A., Pajek, M., Reinhardt, F., Savu, A.V., Szlachetko, J.

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A new generation of x-ray spectrometry UHV instruments at the SR facilities BESSY II, ELETTRA and SOLEIL von Lubeck, J., Bogovac, M., Boyer, B., Detlefs, B., Eichert, D., Fliegauf, R., Grötzsch, D., Holfelder, I., Hönicke, P., Jark, W., Kaiser, R. B., Kanngießer, B., Karydas, A. G., Leani, J. J., Lépy, M. C., Lühl, L., Ménesguen, Y., Migliori, A., Müller, M., Pollakowski, B., Spanier, M., Sghaier, H., Ulm, G., Weser, J., Beckhoff, B.

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Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques von Giubertoni, Damiano, Iacob, Erica, Hoenicke, P., Beckhoff, B., Pepponi, Giancarlo, Gennaro, Salvatore, Bersani, Massimo

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Depth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray flourescence von Hönicke, P., Beckhoff, B., Kolbe, M., List, S., Conard, T., Struyff, H.

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Self-Affine Surface Roughness of Chemically and Thermally Cleaned Ge(100) Surfaces von Fleischmann, C., Houssa, M., Sioncke, S., Beckhoff, B., Müller, M., Hönicke, P., Meuris, M., Temst, K., Vantomme, A.

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Reliable Quantification of Inorganic Contamination by TXRF von Nutsch, Andreas, Borionetti, Gabriella, Müller, Matthias, Altmann, Roswitha, Kolbe, Michael, Mantler, C., Hönicke, Philipp, Holz, T., Beckhoff, Burkhard

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