Influence of the annealing temperature of (n) poly-Si/SiOx passivating contacts on their firing stability von Linke, Jonathan, Hoß, Jan, Buchholz, Florian, Lossen, Jan, Kopecek, Radovan

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The role of masking layers during metallization of poly-Si/SiOx contacts von Linke, Jonathan, Buchholz, Florian, Peter, Christoph, Hoß, Jan, Lossen, Jan, Kopecek, Radovan

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Three-Step Process for Efficient Solar Cells with Boron-Doped Passivated Contacts von Sharbaf Kalaghichi, Saman, Hoß, Jan, Linke, Jonathan, Lange, Stefan, Werner, Jürgen H.

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Influence of Polysilicon Thickness on Properties of Screen‐Printed Silver Paste Metallized Silicon Oxide/Polysilicon Passivated Contacts von Chaudhary, Aditya, Hoß, Jan, Lossen, Jan, Huster, Frank, Kopecek, Radovan, van Swaaij, René, Zeman, Miro

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Influence of Silicon Substrate Surface Finish on the Screen‐Printed Silver Metallization of Polysilicon‐Based Passivating Contacts von Chaudhary, Aditya, Hoß, Jan, Lossen, Jan, Huster, Frank, Kopecek, Radovan, van Swaaij, René, Zeman, Miro

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In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition with a High Deposition Rate of 42 nm/min von Li, Shenghao, Pomaska, Manuel, Hoß, Jan, Lossen, Jan, Ziegner, Mirko, Hong, Ruijiang, Finger, Friedhelm, Rau, Uwe, Ding, Kaining

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Screen printed Ag contacts for n-type polysilicon passivated contacts von Chaudhary, Aditya, Hoß, Jan, Lossen, Jan, van Swaaij, René, Zeman, Miro

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Advancement in screen printed fire through silver paste metallisation of polysilicon based passivating contacts von Chaudhary, Aditya, Hoß, Jan, Lossen, Jan, van Swaaij, René, Zeman, Miro

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High‐quality amorphous silicon thin films for tunnel oxide passivating contacts deposited at over 150 nm/min von Li, Shenghao, Pomaska, Manuel, Hoß, Jan, Lossen, Jan, Qiu, Kaifu, Hong, Ruijiang, Finger, Friedhelm, Rau, Uwe, Ding, Kaining

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Sputtering of silicon thin films for passivated contacts von Hoß, Jan, Baumann, Jens, Berendt, Markus, Graupner, Uwe, Köhler, René, Lossen, Jan, Thumsch, Martin, Schneiderlöchner, Eric

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Laser Activation for Highly Boron-Doped Passivated Contacts von Sharbaf Kalaghichi, Saman, Hoß, Jan, Zapf-Gottwick, Renate, Werner, Jürgen H.

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Poly-Si/SiOx/c-Si passivating contact with 738 mV implied open circuit voltage fabricated by hot-wire chemical vapor deposition von Li, Shenghao, Pomaska, Manuel, Hoß, Jan, Lossen, Jan, Pennartz, Frank, Nuys, Maurice, Hong, Ruijiang, Schmalen, Andreas, Wolff, Johannes, Finger, Friedhelm, Rau, Uwe, Ding, Kaining

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TOPCon Solar Cells With Al-Free Ag and Cu Metallization von Jan Lossen, Pirmin Preis, Mertcan Comak, Joris Libal, Dominik Rudolph, Jan Hoß, Lejo Joseph Koduvelikulathu

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Screen Printed Fire-Through Contact Formation for Polysilicon-Passivated Contacts and Phosphorus-Diffused Contacts von Chaudhary, Aditya, Hos, Jan, Lossen, Jan, Huster, Frank, Kopecek, Radovan, van Swaaij, Rene, Zeman, Miro

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Poly-Si/SiOx/c-Si passivating contact with 738 mV implied opencircuit voltage fabricated by hot-wire chemical vapor deposition von Pomaska Manuel, Hoß Jan, Lossen Jan, Pennartz, Frank, Nuys Maurice, Hong Ruijiang, Schmalen Andreas, Wolff, Johannes, Finger Friedhelm, Rau Uwe, Ding Kaining

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Radiation tolerance of the readout chip for the Phase I upgrade of the CMS pixel detector von Hoss, J., Kästli, H.-C., Meier, B., Rohe, T., Starodumov, A.

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INTERDIGITATED BACK CONTACT SOLAR CELL AND METHOD FOR PRODUCING AN INTERDIGITATED BACK CONTACT SOLAR CELL von HOSS, Jan, BUCHHOLZ, Florian, LINKE, Jonathan

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INTERDIGITATED BACK CONTACT SOLAR CELL AND METHOD FOR PRODUCING AN INTERDIGITATED BACK CONTACT SOLAR CELL von Linke, Jonathan, Buchholz, Florian, Hoss, Jan

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Method for local modification of etching resistance in a silicon layer, use of this method in the productions of passivating contact solar cells and thus-created solar cell von CHU, Haifeng, HOSS, Jan, BUCHHOLZ, Florian, LOSSEN, Jan, MIHAILETCHI, Valentin Dan

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Cross back contact solar cell and method for producing cross back contact solar cell von BUCHHOLZ FLORIAN, HOSS JAN, LINK JONATHAN

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