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  1. 1
    Triple high k stacks (Al2O3/HfO2/Al2O3) with high pressure (10atm) H2 and D2annealing for SONOS type flash memory device applications

    Triple high k stacks (Al2O3/HfO2/Al2O3) with high pressure (10atm) H2 and D2annealing for SONOS type flash memory device applications von JEON, Sanghun, CHOI, Sangmoo, PARK, Yoondong, SEO, Sunare, JO WON LEE, CHUNG WOO KIM, PARK, Hokyung, HWANG, Hyunsang, JUNG HEE HAN, CHAE, Hisun, SOO DOO CHAE, JU HYUNG KIM, MOON KYUNG KIM, YOUN SEOK JEONG

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  2. 2
    Triple high /spl kappa/ stacks (Al/sub 2/O/sub 3//HfO/sub 2//Al/sub 2/O/sub 3/) with high pressure (10 atm) H/sub 2/ and D/sub 2/ annealing for SONOS type flash memory device applications

    Triple high /spl kappa/ stacks (Al/sub 2/O/sub 3//HfO/sub 2//Al/sub 2/O/sub 3/) with high pressure (10 atm) H/sub 2/ and D/sub 2/ annealing for SONOS type flash memory device appli... von Sanghun Jeon, Choi, S., Park, H., Hyunsang Hwang, Jung Hee Han, Hisun Chae, Soo Doo Chae, Ju Hyung Kim, Moon Kyung Kim, Youn Seok Jeong, Yoondong Park, Sunare Seo, Jo Won Lee, Chung Woo Kim

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