Visualization of Acoustic Waves and Cavitation in Ultrasonic Water Flow von Usui, Hidehisa, Ando, Keita, Ishibashi, Tomoatsu, Matsuo, Hisanori, Watanabe, Katsuhide

Volltext

The endpoint detection method using moiré pattern in CMP’s EPD system von Takitani, Sho, Yamamoto, Soma, Matsuo, Hisanori, Watanabe, Katsuhide, Suzuki, Keisuke

Volltext

Theoretical Analysis of Elastic Modulus and Dielectric Constant for Low- k Two-Dimensional Periodic Porous Silica Films von Miyoshi, Hidenori, Matsuo, Hisanori, Oku, Yoshiaki, Tanaka, Hirofumi, Yamada, Kazuhiro, Mikami, Noboru, Takada, Syozo, Hata, Nobuhiro, Kikkawa, Takamaro

Volltext

Optimal Injection Distance in Ultrasonic Water Flow Cleaning von Sakota, Riria, Usui, Hidehisa, Ando, Keita, Ishibashi, Tomoatsu, Matsuo, Hisanori, Watanabe, Katsuhide

Volltext

Parametric Studies on Particle Removal and Erosion in Nozzle Injection Megasonic Cleaning von Sakota, Riria, Usui, Hidehisa, Ando, Keita, Ishibashi, Tomoatsu, Matsuo, Hisanori, Watanabe, Katsuhide

Volltext

Planarization profile modeling using pad bulk deformation and real contact area analysis of macro-scale device pattern von Jeong, Seonho, Jeong, Jongmin, Shin, Yeongil, Park, Youngwook, Kabasawa, Masashi, Hiyama, Hirokuni, Watanabe, Katsuhide, Matsuo, Hisanori, Wada, Yutaka, Jeong, Haedo

Volltext

Particle Removal in Ultrasonic Water Flow Cleaning Role of Cavitation Bubbles as Cleaning Agents von Sugawara, Mao, Ando, Keita, Sakota, Riria

Volltext

Role of Frictional Force on the Polishing Rate of Cu Chemical Mechanical Polishing von Matsuo, Hisanori, Ishikawa, Akira, Kikkawa, Takamaro

Volltext

Theoretical Investigation of Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films with Elliptical Cylindrical Pores von Miyoshi, Hidenori, Matsuo, Hisanori, Tanaka, Hirofumi, Yamada, Kazuhiro, Oku, Yoshiaki, Takada, Syozo, Hata, Nobuhiro, Kikkawa, Takamaro

Volltext

Theoretical Investigation of Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements von Miyoshi, Hidenori, Yamada, Kazuhiro, Kohmura, Kazuo, Fujii, Nobutoshi, Matsuo, Hisanori, Tanaka, Hirofumi, Oku, Yoshiaki, Seino, Yutaka, Hata, Nobuhiro, Kikkawa, Takamaro

Volltext

Physical Simulation and Visualization of the Marangoni Convection inside Meniscus Region under IPA Vapor in Wafer Drying Process von Ono, Naoki, Yamada, Takashi, Miura, Shumpei, Ishibashi, Tomoatsu, Matsuo, Hisanori, Watanabe, Katsuhide

Volltext

POLISHING APPARATUS von MATSUO, Hisanori

Volltext bestellen

POLISHING APPARATUS AND POLISHING METHOD von SUZUKI, Keisuke, MATSUO, Hisanori

Volltext bestellen

CMP apparatus having polishing pad surface property measuring device von Matsuo, Hisanori

Volltext bestellen

Influence of Slurry Chemistry on Frictional Force in Copper Chemical Mechanical Polishing von Ishikawa, Akira, Matsuo, Hisanori, Kikkawa, Takamaro

Volltext

CMP APPARATUS HAVING POLISHING PAD SURFACE PROPERTY MEASURING DEVICE von MATSUO Hisanori

Volltext bestellen

CMP APPARATUS HAVING POLISHING PAD SURFACE PROPERTY MEASURING DEVICE von MATSUO, Hisanori

Volltext bestellen

Measuring method of surface roughness of polishing pad von MATSUO HISANORI

Volltext bestellen

연마 장치 von MATSUO HISANORI, SUZUKI KEISUKE

Volltext bestellen

Effect of frictional force vector on delamination in Cu/low- k integration von Matsuo, Hisanori, Kondo, Seiichi, Ishikawa, Akira, Fukaya, Koichi, Kobayashi, Nobuyoshi, Kikkawa, Takamaro

Volltext