Reduced self-heating in Si/SiGe field-effect transistors on thin virtual substrates prepared by low-energy plasma-enhanced chemical vapor deposition von Hackbarth, T., Herzog, H.-J., Hieber, K.-H., König, U., Bollani, M., Chrastina, D., von Känel, H.

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Identification of genetic markers and QTL for carcass quality traits within the American Simmental Association Carcass Merit Program von Hieber, Jordan K, Endecott, Rachel L, Thomson, Jennifer M

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Adult pediatric patients von Carson, A R, Hieber, K V

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PSV-12 Evaluator effect on the prediction of genetic merit using subjective measures of beef cattle temperament von Celestino, Elfren F, Hieber, Jordan K, Dahlen, Carl R, Riley, David G, Wagner, Sarah A, Hulsman Hanna, Lauren L

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Evaluator effect on the prediction of genetic merit using subjective measures of beef cattle temperament von Celestino, Elfren F, Hieber, Jordan K, Dahlen, Carl R, Riley, David G, Wagner, Sarah A, Hanna, Lauren L Hulsman

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Inbreeding levels of the Line 1 and Line 4 Hereford cattle populations von Hieber, Jordan K, Dafoe, Julia M, Parsons, Cory T, Anderson, Don C, Boss, Darrin L, Boles, Jane A, Thomson, Jennifer M

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Blood collection has negligible impact on scoring temperament in Angus-based weaned calves von Hulsman Hanna, Lauren L., Hieber, Jordan K., Yu, Haipeng, Celestino, Elfren F., Dahlen, Carl R., Wagner, Sarah A., Riley, David G.

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Planarized metal deposition in VLSI technology von Hieber, K.

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040 Impact of blood collection on scoring temperament in angus-based weaned calves is negligible von Hanna, L. L. Hulsman, Hieber, J. K., Yu, H., Dahlen, C. R., Wagner, S. A., Riley, D. G.

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Application of Bioactive Layers for Chemical Sensors and Analysis Systems von Koch, S., Drost, S., Hieber, K., Kößlinger, C., Yacoub-George, E., Wolf, Herbert, Hauck, S., Hillerich, B.

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Chemical vapour deposition of oxide and metal films for VLSI applications von Hieber, K, Körner, H, Treichel, H

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Possible applications of tantalum silicide for very-large-scale integration technology von Hieber, K., Neppl, F.

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Stabilization of sputtered β-tantalum by a tantalum silicide interlayer von Hieber, K., Lautenbacher, E.

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Structural and electrical properties of evaporated Cr-Ni films as a function of gas pressure von Lassak, L., Hieber, K.

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A SiGe HEMT mixer IC with low conversion loss von Kallfass, I., Gruson, F., Abele, P., Michelakis, K., Hackbarth, T., Hieber, K.-H., Muller, J., Schumacher, H.

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Structural and electrical properties of chromium and nickel films evaporated in the presence of oxygen von Hieber, K., Lassak, L.

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The temperature coefficient of resistance of bulk Ta2N von Hieber, K., Meyer, A.

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Structural Changes of Evaporated Tantalum During Film Growth von Hieber, K, Mayer, N M

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Structural and electrical properties of CrSi 2 thin film resistors von Hieber, K., Dittmann, R.

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Structural and Electrical Properties of Cr and Ni Films Evaporated in the Presence of O von Hieber, K, Lassak, L

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