A new type of local defects in very thin silicon dioxide films on arsenic-implanted p-type silicon von Lau, W.S., Pey, K.S., Ng, W.T., Sane, V., Heng, J.M.C., Phang, J.C.H., Chan, D.S.H., Chua, C.M., Cronquist, B., Lee, B.

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