Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies von Faraz, T, Knoops, H.C.M, Verheijen, M.A, Helvoirt, C.A.A. van, Karwal, S, Sharma, A, Beladiya, V, Szeghalmi, A, Hausmann, D.M, Henri, J, Creatore, M, Kessels, W.M.M

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