Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers von Puttaswamy, Manjunath, Vehkamäki, Marko, Kukli, Kaupo, Dimri, Mukesh Chandra, Kemell, Marianna, Hatanpää, Timo, Heikkilä, Mikko J., Mizohata, Kenichiro, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition and Characterization of Bi sub(2)Te sub(3) Thin Films von Sarnet, Tiina, Hatanpaeae, Timo, Puukilainen, Esa, Mattinen, Miika, Vehkamaeki, Marko, Mizohata, Kenichiro, Ritala, Mikko, Leskelae, Markku

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Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)3As through the GaAs process von Sarnet, Tiina, Hatanpää, Timo, Laitinen, Mikko, Sajavaara, Timo, Mizohata, Kenichiro, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Ferroelectric Bismuth Titanate Bi4Ti3O12 Thin Films von Vehkamäki, Marko, Hatanpää, Timo, Kemell, Marianna, Ritala, Mikko, Leskelä, Markku

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Bismuth(III) Alkoxide Catalysts for Ring-Opening Polymerization of Lactides and -Caprolactone von Vuorinen, Sirpa, Lahcini, Mohammed, Hatanpaeae, Timo, Sundberg, Markku, Leskelae, Markku, Repo, Timo

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Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates von Niskanen, A., Hatanpää, T., Arstila, K., Leskelä, M., Ritala, M.

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(Et sub(3)Si) sub(2)Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi sub(2)Se sub(3) von Sarnet, Tiina, Hatanpaeae, Timo, Vehkamaeki, Marko, Flyktman, Timo, Ahopelto, Jouni, Mizohata, Kenichiro, Ritala, Mikko, Leskelae, Markku

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Atomic layer deposition of Ge@@d2@Sb@@d2@Te@@d5@ thin films von Ritala, Mikko, Pore, Viljami, Hatanpaeae, Timo, Heikkilae, Mikko, Leskelae, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M

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Study of a novel ALD process for depositing MgF2 thin films von PILVI, Tero, HATANPÄÄ, Timo, PUUKILAINEN, Esa, ARSFLLA, Kai, BISCHOFF, Martin, KAISER, Ute, KAISER, Norbert, LESKELÄ, Markku, RITALA, Mikko

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METHODS FOR SYNTHESIZING AND USING ALD PRECURSORS OF MOLYBDENUM OR TUNGSTEN CONTAINING THIN FILMS von TIMO HATANPAEAE, TIINA SARNET, RITALA MIKKO, LESKELA MARKKU

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SYNTHESIS AND USAGE OF PRECURSORS FOR ALD OF MOLYBDENUM- OR TUNGSTEN-CONTAINING THIN FILMS von TIMO HATANPAEAE, TIINA SARNET, RITALA MIKKO, LESKELA MARKKU

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METHOD FOR FORMING TRANSITION METAL-CONTAINING FILM ON SUBSTRATE BY PERIODIC DEPOSITION PROCESS von TIMO HATANPAEAE, KATJA VAEYRYNEN, RITALA MIKKO, MARKKU LESKELAE

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METHODS OF FORMING A TRANSITION METAL CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS von RITALA MIKKO, LESKELAE MARKKU, VAEYRYNEN KATJA, HATANPAEAE TIMO

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ChemInform Abstract: Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium von Pore, Viljami, Hatanpaeae, Timo, Ritala, Mikko, Leskelae, Markku

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Methods for forming thin films comprising tellurium von RITALA MIKKO, LESKELAE MARKKU, HATANPAEAE TIMO, PORE VILJAMI

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SYNTHESIS AND USE OF PRECURSORS FOR ALD OF GROUP VA ELEMENT CONTAINING THIN FILMS von RITALA MIKKO, LESKELAE MARKKU, HATANPAEAE TIMO, PORE VILJAMI

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ATOMIC LAYER DEPOSITION OF ANTIMONY CONTAINING THIN FILMS von PORE, VILJAMI, RITALA, MIKKO, HATANPAEAE, TIMO, LESKELAE, MARKKU

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SYNTHESIS AND USE OF PRECURSORS FOR ALD OF GROUP VA ELEMENT CONTAINING THIN FILMS von PORE, VILJAMI, RITALA, MIKKO, HATANPAEAE, TIMO, LESKELAE, MARKKU

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SYNTHESIS AND USE OF PRECURSORS FOR ALD OF GROUP VA ELEMENT CONTAINING THIN FILMS von PORE, VILJAMI, RITALA, MIKKO, HATANPAEAE, TIMO, LESKELAE, MARKKU

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SYNTHESIS AND USE OF PRECURSORS FOR ALD OF TELLURIUM AND SELENIUM THIN FILMS von PORE, VILJAMI, RITALA, MIKKO, LESKELA, MARKKU, HATANPAEAE, TIMO

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