High performance diffraction gratings made by e-beam lithography von Zeitner, Uwe D., Oliva, Maria, Fuchs, Frank, Michaelis, Dirk, Benkenstein, Tino, Harzendorf, Torsten, Kley, Ernst-Bernhard

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Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect von Stuerzebecher, Lorenz, Harzendorf, Torsten, Vogler, Uwe, Zeitner, Uwe D, Voelkel, Reinhard

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Pulse compression grating fabrication by diffractive proximity photolithography von Stuerzebecher, Lorenz, Fuchs, Frank, Harzendorf, Torsten, Zeitner, Uwe D

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Highly efficient three-level blazed grating in the resonance domain von OLIVA, Maria, MICHAELIS, Dirk, BENKENSTEIN, Tino, DUNKEL, Jens, HARZENDORF, Torsten, MATTHES, Andre, ZEITNER, Uwe D

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Waveguide Grating Radial Polarizer for the Photolithography of Circularly Symmetrical Optical Elements von Jourlin, Yves, Tonchev, Svetlen, Parriaux, Olivier, Sauvage-Vincent, Jean, Harzendorf, Torsten, Zeitner, Uwe

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Black and white fused silica: modified sol-gel process combined with moth-eye structuring for highly absorbing and diffuse reflecting SiO 2 glass von Brunner, Robert, Kraus, Matthias, Hirte, Johannes, Diao, Zhaolu, Weishaupt, Klaus, Spatz, Joachim P., Harzendorf, Torsten, Trost, Marcus, Munser, Anne-Sophie, Schröder, Sven, Baer, Michael

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Black and white fused silica: modified sol-gel process combined with moth-eye structuring for highly absorbing and diffuse reflecting SiO2 glass von Brunner, Robert, Kraus, Matthias, Hirte, Johannes, Diao, Zhaolu, Weishaupt, Klaus, Spatz, Joachim P, Harzendorf, Torsten, Trost, Marcus, Munser, Anne-Sophie, Schröder, Sven, Baer, Michael

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Advanced mask aligner lithography: new illumination system von Voelkel, Reinhard, Vogler, Uwe, Bich, Andreas, Pernet, Pascal, Weible, Kenneth J, Hornung, Michael, Zoberbier, Ralph, Cullmann, Elmar, Stuerzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D

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Ultra-high aspect ratio replaceable AFM tips using deformation-suppressed focused ion beam milling von Savenko, Alexey, Yildiz, Izzet, Petersen, Dirch Hjorth, Bøggild, Peter, Bartenwerfer, Malte, Krohs, Florian, Oliva, Maria, Harzendorf, Torsten

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Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings von Paul, Thomas, Matthes, Andre, Harzendorf, Torsten, Ratzsch, Stephan, Zeitner, Uwe D.

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Exposure unit and device for lithographic exposure von Stürzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D

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OPTICAL ASSEMBLY FOR THE SPECTRAL DISPERSION OF LIGHT von Flügel-Paul, Thomas, Michaelis, Dirk, Harzendorf, Torsten, Zeitner, Uwe Detlef

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Exposure unit and device for lithographic exposure von Stürzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D

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Optical Arrangement for Spectral Decomposition of Light von Harzendorf Torsten, Michaelis Dirk, Zeitner Uwe Detlef, Flügel-Paul Thomas

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Optische Anordnung zur spektralen Zerlegung von Licht von Flügel-Paul, Thomas, Harzendorf, Torsten, Michaelis, Dirk, Zeitner, Uwe Detlef

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METHOD AND DEVICE FOR MEASURING DISTANCE USING A DIFFRACTIVE STRUCTURE von VOGLER, Uwe, HARZENDORF, Torsten, ZEITNER, Uwe D, STÜRZEBECHER, Lorenz, VÖLKEL, Reinhard

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Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings von Paul, Thomas, Matthes, Andre, Harzendorf, Torsten, Ratzsch, Stephan, Zeitner, Uwe D

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OPTISCHER UMSCHALTER von HARZENDORF, TORSTEN, WIPPERMANN, FRANK

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OPTICAL COMMUTATOR von HARZENDORF, TORSTEN, WIPPERMANN, FRANK

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Waveguide grating radial polarizer for the photolithography of circularly symmetrical optical elements von Jourlin, Yves, Tonchev, Svetlen, Parriaux, Olivier, Sauvage-Vincent, Jean, Harzendorf, Torsten, Zeitner, Uwe D

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