Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies von Potyrailo, Radislav A., Bonam, Ravi K., Hartley, John G., Starkey, Timothy A., Vukusic, Peter, Vasudev, Milana, Bunning, Timothy, Naik, Rajesh R., Tang, Zhexiong, Palacios, Manuel A., Larsen, Michael, Le Tarte, Laurie A., Grande, James C., Zhong, Sheng, Deng, Tao

Volltext

Bossung curves and focus stigmation matrices for Gaussian beam lithography von Raghunathan, Ananthan, Hartley, John G., Crosland, Nigel

Volltext

13nm gate Intentional Defect Array (IDA) wafer patterning by e-beam lithography for defect metrology evaluation von Raghunathan, Ananthan, Bennett, Steve, Stamper, Harlem O., Hartley, John G., Arceo, Abraham, Johnson, Mark, Deeb, Chris, Patel, Dilip, Nadeau, Jim

Volltext

Large area three dimensional structure fabrication using multilayer electron beam lithography von Bonam, Ravi K., Hartley, John G.

Volltext

Materials characterization for multilayer electron beam lithography von Bonam, Ravi K., Hartley, John G.

Volltext

Electron beam lithography patterned hydrogen silsesquioxane resist as a mandrel for self-aligned double patterning application von Desai, Vishal U., Hartley, John G., Cady, Nathaniel C.

Volltext

Influence of secondary electrons in high-energy electron beam lithography von Raghunathan, Ananthan, Hartley, John G.

Volltext

Fluorescent Tag Based Metrology for Self-Assembled Molecular Devices von Ruan, Junru, Raghunathan, Sudharshanan, Hartley, John G, Singh, Krishna V, Akin, Hayri E, Portney, Nathaniel G, Ozkan, Mihrimah

Volltext

Spatial-phase locking with shaped-beam lithography von Hartley, John G., Groves, Timothy R., Smith, Henry I., Mondol, Mark K., Goodberlet, James G., Schattenburg, Mark L., Ferrera, Juan, Bernshteyn, Alexandr

Volltext

Electron Beam Lithography for Biological Applications von Hartley, John G.

Volltext

Methods for fabricating three-dimensional nano-scale structures and devices von HARTLEY JOHN G, BONAM RAVI K

Volltext bestellen

Charging and error budgets in electron beam lithography tools von Hartley, John G., Lyons, Adam

Volltext

Coherent states for the time-dependent harmonic oscillator von Hartley, John G., Ray, John R.

Volltext

METHODS FOR FABRICATING THREE-DIMENSIONAL NANO-SCALE STRUCTURES AND DEVICES von HARTLEY JOHN G, BONAM RAVI K

Volltext bestellen

Methods, devices, and systems for manipulating charged particle streams von HARTLEY JOHN G, RUAN JUNRU, DENBEAUX GREGORY

Volltext bestellen

METHODS, DEVICES, AND SYSTEMS FOR MANIPULATING CHARGED PARTICLE STREAMS von HARTLEY JOHN G, RUAN JUNRU, DENBEAUX GREGORY

Volltext bestellen

METHODS, DEVICES, AND SYSTEMS FOR MANIPULATING CHARGED PARTICLE STREAMS von RUAN, JUNRU, HARTLEY, JOHN G, DENBEAUX, GREGORY

Volltext bestellen

METHODS, DEVICES, AND SYSTEMS FOR MANIPULATING CHARGED PARTICLE STREAMS von RUAN, JUNRU, HARTLEY, JOHN G, DENBEAUX, GREGORY

Volltext bestellen

Multi-beam shaped beam lithography system von HARTLEY JOHN G

Volltext bestellen

Multi-beam shaped beam lithography system von Hartley, John G

Volltext bestellen