Opto-acoustic effect. Revival of an old technique for molecular spectroscopy von Harshbarger, William R, Robin, Melvin B

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Identification of the C̃ State of Ammonia by Electron Impact Spectroscopy von Harshbarger, William R.

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Structure of the A 1 2″ State of NH 3 von Harshbarger, William R.

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On the electron impact spectra of CH4 and CF4 von Harshbarger, William R., Lassettre, Edwin N.

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Generalized Oscillator Strength of the Ã ← X̃ Transition of Ammonia von Harshbarger, William R., Skerbele, Ausma, Lassettre, Edwin N.

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The electron impact spectra of the fluoromethanes von Harshbarger, William R., Robin, M.B., Lassettre, Edwin N.

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IMPROVED CHAMBER CLEANING METHOD AND APPARATUS von GREEN ROBERT I, HARSHBARGER WILLIAM R, SUN SHENG, SHANG QUANYUAN

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PROCESS FOR CONTROLLING THIN FILM UNIFORMITY, AND PRODUCTS PRODUCED THEREBY von WON TAE KYUNG, HARSHBARGER WILLIAM R, TAKEHARA TAKAKO

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IMPROVED CHAMBER CLEANING METHOD AND APPARATUS von GREEN ROBERT I, HARSHBARGER WILLIAM R, SUN SHENG, SHANG QUANYUAN

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Method and apparatus for dechucking a substrate von GREENE, ROBERT I, HARSHBARGER, WILLIAM R, SHANG, QUANYUAN, SHIMIZU, ICHIRO

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Franck–Condon Factors for the Ã←X̃ Transition of Ammonia with Anharmonic Potential Functions for the Ground and Excited States von Harshbarger, William R.

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Shadow frame with cross beam for semiconductor equipment von TANAKA SAKAE, YADAV SANJAY, HARSHBARGER WILLIAM R, SHANG QUANYUAN, WANG QUNHUA

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Shadow frame with cross beam for semiconductor equipment von Tanaka, Sakae, Wang, Qunhua, Yadav, Sanjay, Shang, Quanyuan, Harshbarger, William R

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Method and apparatus for enhanced chamber cleaning von GREENE, ROBERT I, HARSHBARGER, WILLIAM R, SUN, SHENG, SHANG, QUANYUAN

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PROCESS FOR CONTROLLING THIN FILM UNIFORMITY AND PRODUCTS PRODUCED THEREBY von WON TAE KYUNG, HARSHBARGER WILLIAM R, TAKEHARA TAKAKO

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METHOD OF CONTROLLING THIN FILM UNIFORMITY AND PRODUCT PRODUCED BY THAT METHOD von WON TAE KYUNG, HARSHBARGER WILLIAM R, TAKEHARA TAKAKO

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Fluorine process for cleaning semiconductor process chamber von GOTO, HARUHIRO HARRY, SHAN, QUANYUAN, HARSHBARGER, WILLIAM, R, LAW, KAM, S

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Fluorine process for cleaning semiconductor process chamber von GOTO, HARUHIRO HARRY, SHAN, QUANYUAN, HARSHBARGER, WILLIAM, R, LAW, KAM, S

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METHOD FOR DECHUCKING A SUBSTRATE von HARSHBARGER WILLIAM R, GREENE ROBERT I, SHANG QUANYUAN, SHIMIZU ICHIRO

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Method for dechucking a substrate von Shang, Quanyuan, Harshbarger, William R, Greene, Robert L, Shimizu, Ichiro

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