Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition von Dang, Van-Son, Parala, Harish, Kim, Jin Hyun, Xu, Ke, Srinivasan, Nagendra B., Edengeiser, Eugen, Havenith, Martina, Wieck, Andreas D., de los Arcos, Teresa, Fischer, Roland. A., Devi, Anjana

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Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors von Milanov, Andrian P, Xu, Ke, Cwik, Stefan, Parala, Harish, de los Arcos, Teresa, Becker, Hans-Werner, Rogalla, Detlef, Cross, Richard, Paul, Shashi, Devi, Anjana

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Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: Growth and characterization von Peeters, Daniel, Carraro, Giorgio, Maccato, Chiara, Parala, Harish, Gasparotto, Alberto, Barreca, Davide, Sada, Cinzia, Kartaschew, Konstantin, Havenith, Martina, Rogalla, Detlef, Becker, Hans-Werner, Devi, Anjana

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A novel preparation of nano-Cu/ZnO by photo-reduction of Cu(OCH(Me)CH2NMe2)2 on ZnO at room temperature von Lu, Lianhai, Wohlfart, Andreas, Parala, Harish, Birkner, Alexander, Fischer, Roland A

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Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development von Mai, Lukas, Gebhard, Maximilian, de los Arcos, Teresa, Giner, Ignacio, Mitschker, Felix, Winter, Manuela, Parala, Harish, Awakowicz, Peter, Grundmeier, Guido, Devi, Anjana

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Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al 2 O 3 : Synthesis, Characterization and ALD Process Developmen... von Mai, Lukas, Gebhard, Maximilian, de Los Arcos, Teresa, Giner, Ignacio, Mitschker, Felix, Winter, Manuela, Parala, Harish, Awakowicz, Peter, Grundmeier, Guido, Devi, Anjana

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Atomic-scale engineering of multifunctional nano-sized materials and films von Roozeboom, Fred, Barreca, Davide, Devi, Anjana, Parala, Harish, Ritala, Mikko

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Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties von Xu, Ke, Ranjith, Ramdurai, Laha, Apurba, Parala, Harish, Milanov, Andrian P, Fischer, Roland A, Bugiel, Eberhard, Feydt, Jürgen, Irsen, Stefan, Toader, Teodor, Bock, Claudia, Rogalla, Detlef, Osten, Hans-Jörg, Kunze, Ulrich, Devi, Anjana

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Growth of Crystalline Gd2O3 Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition von Milanov, Andrian P, Xu, Ke, Laha, Apurba, Bugiel, Eberhard, Ranjith, Ramadurai, Schwendt, Dominik, Osten, H. Jörg, Parala, Harish, Fischer, Roland A, Devi, Anjana

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Intrinsic Nitrogen-doped CVD-grown TiO2 Thin Films from All-N-coordinated Ti Precursors for Photoelectrochemical Applications von Kim, Sun Ja, Xu, Ke, Parala, Harish, Beranek, Radim, Bledowski, Michal, Sliozberg, Kirill, Becker, Hans-Werner, Rogalla, Detlef, Barreca, Davide, Maccato, Chiara, Sada, Cinzia, Schuhmann, Wolfgang, Fischer, Roland A., Devi, Anjana

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New Tungsten(VI) Guanidinato Complexes:  Synthesis, Characterization, and Application in Metal−Organic Chemical Vapor Deposition of Tungsten Nitride Thin Films von Rische, Daniel, Parala, Harish, Gemel, Eliza, Winter, Manuela, Fischer, Roland A

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Mixed amido/imido/guanidinato complexes of niobium: potential precursors for MOCVD of niobium nitride thin films von Baunemann, Arne, Bekermann, Daniela, Thiede, Tobias B, Parala, Harish, Winter, Manuela, Gemel, Christian, Fischer, Roland A

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Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties von Xu, Ke, Chaudhuri, Ayan Roy, Parala, Harish, Schwendt, Dominik, Arcos, Teresa de los, Osten, H. Jörg, Devi, Anjana

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Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films von Pothiraja, Ramasamy, Milanov, Andrian, Parala, Harish, Winter, Manuela, Fischer, Roland A, Devi, Anjana

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Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors von Milanov, Andrian P, Toader, Teodor, Parala, Harish, Barreca, Davide, Gasparotto, Alberto, Bock, Claudia, Becker, Hans-Werner, Ngwashi, Divine K, Cross, Richard, Paul, Shashi, Kunze, Ulrich, Fischer, Roland A, Devi, Anjana

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Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition von Devi, Anjana, Cwik, Stefan, Xu, Ke, Milanov, Andrian P., Noei, Heshmat, Wang, Yuemin, Barreca, Davide, Meijer, Jan, Rogalla, Detlef, Kahn, Divine, Cross, Richard, Parala, Harish, Paul, Shashi

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Guanidinato-based precursors for MOCVD of metal nitrides (M x N: M = Ta,W) von Rische, Daniel, Parala, Harish, Baunemann, Arne, Thiede, Tobias, Fischer, Roland

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Investigation of Optical, Electrical, and Mechanical Properties of MOCVD‐grown ZrO 2 Films von Dang, Van‐Son, Banerjee, Manish, Zhu, Huaizhi, Srinivasan, Nagendra Babu, Parala, Harish, Pfetzing‐Micklich, Janine, Wieck, Andreas D., Devi, Anjana

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Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO sub(2) Films von Dang, Van-Son, Banerjee, Manish, Zhu, Huaizhi, Srinivasan, Nagendra Babu, Parala, Harish, Pfetzing-Micklich, Janine, Wieck, Andreas D, Devi, Anjana

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Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO2 Films von Dang, Van-Son, Banerjee, Manish, Zhu, Huaizhi, Srinivasan, Nagendra Babu, Parala, Harish, Pfetzing-Micklich, Janine, Wieck, Andreas D., Devi, Anjana

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