A digital single-molecule nanopillar SERS platform for predicting and monitoring immune toxicities in immunotherapy von Li, Junrong, Wuethrich, Alain, Sina, Abu A. I., Cheng, Han-Hao, Wang, Yuling, Behren, Andreas, Mainwaring, Paul N., Trau, Matt

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A robust method for particulate detection of a genetic tag for 3D electron microscopy von Rae, James, Ferguson, Charles, Ariotti, Nicholas, Webb, Richard I, Cheng, Han-Hao, Mead, James L, Riches, James D, Hunter, Dominic Jb, Martel, Nick, Baltos, Joanne, Christopoulos, Arthur, Bryce, Nicole S, Cagigas, Maria Lastra, Fonseka, Sachini, Sayre, Marcel E, Hardeman, Edna C, Gunning, Peter W, Gambin, Yann, Hall, Thomas E, Parton, Robert G

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Control of the Orientation of Symmetric Poly(styrene)-block-poly(d,l‑lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition von Keen, Imelda, Yu, Anguang, Cheng, Han-Hao, Jack, Kevin S, Nicholson, Timothy M, Whittaker, Andrew K, Blakey, Idriss

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Strain Effect in Highly‐Doped n‐Type 3C‐SiC‐on‐Glass Substrate for Mechanical Sensors and Mobility Enhancement von Phan, Hoang‐Phuong, Nguyen, Tuan‐Khoa, Dinh, Toan, Cheng, Han‐Hao, Mu, Fengwen, Iacopi, Alan, Hold, Leonie, Dao, Dzung Viet, Suga, Tadatomo, Senesky, Debbie G., Nguyen, Nam‐Trung

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Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures von Keen, Imelda, Cheng, Han-Hao, Yu, Anguang, Jack, Kevin S, Younkin, Todd R, Leeson, Michael J, Whittaker, Andrew K, Blakey, Idriss

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Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process von Chuang, Ya-Mi, Jack, Kevin S., Cheng, Han-Hao, Whittaker, Andrew K., Blakey, Idriss

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Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability von Jiang, Zhen, Cheng, Han-Hao, Blakey, Idriss, Whittaker, Andrew K

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Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate von Jiang, Zhen, Alam, Md Mahbub, Cheng, Han-Hao, Blakey, Idriss, Whittaker, Andrew K

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A systematic approach towards biomimicry of nanopatterned cicada wings on titanium using electron beam lithography von Shahali, Hesam, Hasan, Jafar, Cheng, Han-Hao, Ramarishna, Seeram, Yarlagadda, Prasad KDV

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Single-Crystalline 3C-SiC anodically Bonded onto Glass: An Excellent Platform for High-Temperature Electronics and Bioapplications von Phan, Hoang-Phuong, Cheng, Han-Hao, Dinh, Toan, Wood, Barry, Nguyen, Tuan-Khoa, Mu, Fengwen, Kamble, Harshad, Vadivelu, Raja, Walker, Glenn, Hold, Leonie, Iacopi, Alan, Haylock, Ben, Dao, Dzung Viet, Lobino, Mirko, Suga, Tadatomo, Nguyen, Nam-Trung

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Mapping bound plasmon propagation on a nanoscale stripe waveguide using quantum dots: influence of spacer layer thickness von Perera, Chamanei S, Funston, Alison M, Cheng, Han-Hao, Vernon, Kristy C

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Electron-beam writing of deoxygenated micro-patterns on graphene oxide film von Wu, Kuang-Hsu, Cheng, Han-Hao, Mohammad, Ali Amdad, Blakey, Idriss, Jack, Kevin, Gentle, Ian R., Wang, Da-Wei

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Unintentionally Doped Epitaxial 3C-SiC(111) Nanothin Film as Material for Highly Sensitive Thermal Sensors at High Temperatures von Dinh, Toan, Phan, Hoang-Phuong, Nguyen, Tuan-Khoa, Balakrishnan, Vivekananthan, Cheng, Han-Hao, Hold, Leonie, Lacopi, Alan, Nguyen, Nam-Trung, Dao, Dzung Viet

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Electron-Beam-Induced Freezing of an Aromatic-Based EUV Resist: A Robust Template for Directed Self-Assembly of Block Copolymers von Han-Hao Cheng, Anguang Yu, Keen, I., Ya-Mi Chuang, Jack, K. S., Leeson, M. J., Younkin, T. R., Blakey, I., Whittaker, A. K.

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Free spectral range electrical tuning of a high quality on-chip microcavity von Bekker, Christiaan, Baker, Christopher G, Kalra, Rachpon, Cheng, Han-Hao, Li, Bei-Bei, Prakash, Varun, Bowen, Warwick P

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Plasmonic ‘top-hat’ nano-star arrays by electron beam lithography von Zhu, Shaoli, Cheng, Han-Hao, Blakey, Idriss, Stokes, Nicholas, Ostrikov, Kostya (Ken), Cortie, Michael

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Directional Coupling to a λ/5000 Nanowaveguide von Tuniz, Alessandro, Garattoni, Sabrina, Cheng, Han-Hao, Della Valle, Giuseppe

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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers von Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.

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Wireless Identification System Based on Radio Frequency Technique von Han, Cheng Hao, Shang, Bing, Ren, Ye

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Aqueous developable dual switching photoresists for nanolithography von Chen, Lan, Goh, Yong Keng, Cheng, Han Hao, Smith, Bruce W., Xie, Peng, Montgomery, Warren, Whittaker, Andrew K., Blakey, Idriss

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