Evaluation of microbial fuel cells for electricity generation from oil-contaminated wastewater von Hamamoto, Kazuhiro, Miyahara, Morio, Kouzuma, Atsushi, Matsumoto, Akiteru, Yoda, Minoru, Ishiguro, Takashi, Watanabe, Kazuya

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Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography von Kinoshita, Hiroo, Hamamoto, Kazuhiro, Sakaya, Nobuyuki, Hosoya, Morio, Watanabe, Takeo

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Phase Defect Observation Using Extreme Ultraviolet Microscope von Hamamoto, Kazuhiro, Tanaka, Yuzuru, Yoshizumi, Takahiro, Hosokawa, Nobuyuki, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection von Hamamoto, Kazuhiro, Tanaka, Yuzuru, Kawashima, Hirotake, Lee, Seung Yoon, Hosokawa, Nobuyuki, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Watanabe, Takeo, Kinoshita, Hiroo

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Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope von Haga, Tsuneyuki, Kinoshita, Hiroo, Hamamoto, Kazuhiro, Takada, Shintaro, Kazui, Naoki, Kakunai, Satoshi, Tsubakino, Harushige, Watanabe, Takeo

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Resist Outgassing Characteristics in Extreme Ultraviolet Lithography von Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo, Hada, Hideo, Komano, Hiroshi

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Reducing off Hydrocarbon Contaminants for EUVL von Tanaka, Yuzuru, Hamamoto, Kazuhiro, Tsubakino, Harushige, Watanabe, Takeo, Kinoshita, Hiroo

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Characteristics of CA Resist in EUV Lithography von Hamamoto, Kazuhiro, Watanabe, Takeo, Hada, Hideo, Komano, Hiroshi, Kinoshita, Hiroo

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Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography von Watanabe, Takeo, Hada, Hideo, Lee, Seung Yoon, Kinoshita, Hiroo, Hamamoto, Kazuhiro, Komano, Hiroshi

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Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System von Watanabe, Takeo, Kinoshita, Hiroo, Hamamoto, Kazuhiro, Hosoya, Morio, Shoki, Tsutomu, Hada, Hideo, Komano, Hiroshi, Okazaki, Shinji

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Resist Outgassing by EUV Irradiation von Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo, Tsubakino, Harushige, Hada, Hideo, Komano, Hiroshi, Endo, Masayuki, Sasago, Masaru

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REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE von HAMAMOTO, Kazuhiro

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Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist von Watanabe, Takeo, Kinoshita, Hiroo, Hamamoto, Kazuhiro, Hada, Hideo, Komano, Hiroshi

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Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope von Tanaka, Yuzuru, Watanabe, Takeo, Hamamoto, Kazuhiro, Kinoshita, Hiroo

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Investigation of Contamination Removal from Finished EUVL Mask von Hamamoto, Kazuhiro, Takada, Shintaro, Watanabe, Takeo, Sakaya, Noriyuki, Shoki, Tsutomu, Hosoya, Morio, Kinoshita, Hiroo

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Fine Pattern Replication by EUV Lithography von Hamamoto, Kazuhiro, Watanabe, Takeo, Tsubakino, Harushige, Kinoshita, Hiroo, Shoki, Tsutomu, Hosoya, Morio

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REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE von HAMAMOTO, Kazuhiro

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Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation von Hamamoto, Kazuhiro, Tanaka, Yuzuru, Watanabe, Takeo, Sakaya, Noriyuki, Hosoya, Morio, Shoki, Tsutomu, Sugahara, Hiroshi, Hishinuma, Nobuyuki, Hada, Hideo, Kinoshita, Hiroo

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Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor device von Shoki, Tsutomu, Hamamoto, Kazuhiro

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Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method von Uchida, Takashi, Hamamoto, Kazuhiro

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