Selective dual-band metamaterial perfect absorber for infrared stealth technology von Kim, Jagyeong, Han, Kiwook, Hahn, Jae W.

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Metal–Semiconductor–Metal Metasurface for Multiband Infrared Stealth Technology Using Camouflage Color Pattern in Visible Range von Kim, Jagyeong, Park, Changhoon, Hahn, Jae W.

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Selective Emitter with Engineered Anisotropic Radiation to Minimize Dual-Band Thermal Signature for Infrared Stealth Technology von Park, Changhoon, Kim, Jagyeong, Hahn, Jae W

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Plasmonic near-field scanning nanoscope with a cross-polarization detection technique von Shim, Hyeon Bo, Hahn, Jae W.

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Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication von Han, Dandan, Park, Changhoon, Oh, Seonghyeon, Jung, Howon, Hahn, Jae W.

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Analyses of pattern quality in roll-to-roll digital maskless lithography with positional errors von Lee, Changmin, Ko, Yunhyeok, Hahn, Jae W

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Integrated Infrared Signature Management with Multispectral Selective Absorber via Single‐Port Grating Resonance von Park, Changhoon, Kim, Jagyeong, Hahn, Jae W.

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A Multispectral Single‐Layer Frequency Selective Surface Absorber for Infrared and Millimeter Wave Selective Bi‐Stealth von Shim, Hyeon Bo, Han, Kiwook, Song, Jookwon, Hahn, Jae W.

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Analysis of the line pattern width and exposure efficiency in maskless lithography using a digital micromirror device von Ryoo, Hoonchul, Kang, Dong Won, Hahn, Jae W.

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Doubly resonant metallic nanostructure for high conversion efficiency of second harmonic generation von Park, Sinjeung, Hahn, Jae W, Lee, Jae Yong

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Characterization of three-dimensional field distribution of bowtie aperture using quasi-spherical waves and surface plasmon polaritons von Park, Changhoon, Jung, Howon, Hahn, Jae W.

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Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulation von Oh, Seonghyeon, Han, Dandan, Shim, Hyeon Bo, Hahn, Jae W

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Relative positioning method for near-field beam spot array with optical microscope image of lithographic patterns using linear regression von Oh, Seonghyeon, Jang, Jinhee, Hahn, Jae W.

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Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch von Kim, Seok, Jung, Howon, Kim, Yongwoo, Jang, Jinhee, Hahn, Jae W.

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Analytical calculation of the light-collection efficiency of an optical emission spectrometer with the effective solid-angle method von Kang, Minwook, Hahn, Jae W

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Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light source von Park, Changhoon, Oh, Seonghyeon, Hahn, Jae W.

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Contact-pressure reduction of pyramidal optical probe array on corrugated aluminium/silicon nitride membranes von Jang, Jinhee, Oh, Seonghyeon, Hahn, Jae W

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Plasmonic nano lithography with a high scan speed contact probe von Kim, Yongwoo, Kim, Seok, Jung, Howon, Lee, Eungman, Hahn, Jae W

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Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layer von Song, Jookwon, Shim, Hyeon Bo, Hahn, Jae W

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Nanoscale 2.5-dimensional surface patterning with plasmonic lithography von Jung, Howon, Park, Changhoon, Oh, Seonghyeon, Hahn, Jae W.

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