라디칼 중합을 이용한 폴리스티렌과 브릿지드 폴리실세스퀴옥세인 나노입자와의 유-무기 복합체 제조 및 분석 von 하태성(Tae-Sung Ha), 황인설(In Seol Hwang), 방윤혁(Yun-Hyuk Bang), 김기영(Ki-Young Kim), 임정혁(Jung-Hyurk Lim), 김성룡(Sung-Ryong Kim), 김경민(Kyung-Min Kim)

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Creation of spherical aggregates of Pd nanoparticles on the surface of POSS-modified graphene oxide von Hwang, In Seol, Kim, Ki-Young, Lim, Jung-Hyurk, Kim, Kyung-Min

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라디칼 중합을 이용한 폴리스티렌과 브릿지드 폴리실세스퀴옥세인 나노입자와의 유-무기 복합체 제조 및 분석 von 하태성, 황인설, 방윤혁, 김기영, 임정혁, 김성룡, 김경민, Ha, Tae-Sung, Hwang, In Seol, Bang, Yun-Hyuk, Kim, Ki-Young, Lim, Jung-Hyurk, Kim, Sung-Ryong, Kim, Kyung-Min

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ONE-COMPONENT POLISHING SLURRY COMPOSITION AND POLISHING METHOD USING SAME von KONG, Hyun Goo, HWANG, In Seol, HWANG, Jin Sook

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SLURRY COMPOSITION FOR METAL FILM FOR CONTACT PROCESS von KIM, Jung Yoon, KONG, Hyun Goo, HWANG, In Seol

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SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING von HWANG Jin Sook, KONG Hyun Goo, HWANG In Seol

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SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING von KONG, Hyun Goo, HWANG, In Seol, HWANG, Jin Sook

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POSS-SH를 함유한 하이브리드 에폭시 수지를 이용한 고분자 시멘트 모르타르 제조 및 분석 von 유호진(Ho-Jin Yoo), 박상현(Sang-Hyeon Park), 황인설(In Seol Hwang), 임정혁(Jung-Hyurk Lim), 김경민(Kyung-Min Kim)

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Semiconductor chip testing apparatus for picking up and testing a semiconductor chip von Choi Duk-Soon, Kim Dong-Shin, Hwang In-Seol, Kwon In-Seob, Park Seong-Han, Jeong Woo-Yoel

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Slurry composition for polishing metal film for contact process von HWANG, IN SEOL, KONG, HYUN GOO, KIM, JUNG YOON

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Slurry composition for polishing metal film for contact process von KONG, HYUN-GOO, HWANG, IN-SEOL, KIM, JUNG-YOON

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Polishing slurry composition von HWANG, IN SEOL, KONG, HYUNGOO, HWANG, JINSOOK, LEE, SANG MI, SHIN,RA

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SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING von HWANG JIN-SOOK, HWANG IN-SEOL, KONG HYUN-GOO

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One-component type slurry composition and method of chemical mechanical polishing using same von KONG, HYUN-GOO, HWANG, JIN-SOOK, HWANG, IN-SEOL

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Polishing slurry composition von KONG, HYUN-GOO, HWANG, JIN-SOOK, LEE, SANG-MI, SHIN, NA-RA, HWANG, IN-SEOL

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DEPOSIT REMOVAL APPARATUS OF SCALE PIT von HWANG, IN SEOL, MOON, HEE SUNG, HAN, HYOUNG KI

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CMP SLURRY COMPOSITION FOR POLISHING METAL von HWANG IN SEOL, SHINRA, KONG HYUN GOO

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SLURRY COMPOSITION FOR POLISHING METAL FILM FOR CONTACT PROCESS von KIM JUNG YOON, HWANG IN SEOL, KONG HYUN GOO

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POLISHING SLURRY COMPOSITION FOR BUFFING PROCESS OF DIELECTRIC LAYER von KIM JUNG YOON, HWANG IN SEOL, KONG HYUN GOO

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