Chemical states of 3d transition metal impurities in a liquid lead-bismuth eutectic analyzed using first principles calculations von Han, Jeong-Hwan, Oda, Takuji

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Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots von Yoon, Jung Ho, Han, Jeong Hwan, Jung, Ji Sim, Jeon, Woojin, Kim, Gun Hwan, Song, Seul Ji, Seok, Jun Yeong, Yoon, Kyung Jean, Lee, Min Hwan, Hwang, Cheol Seong

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Effect of Ag Concentration Dispersed in HfOx Thin Films on Threshold Switching von Jeong, Won Hee, Han, Jeong Hwan, Choi, Byung Joon

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High-performance Atomic-Layer-Deposited SnO thin film transistors fabricated by intense pulsed light annealing von Kim, Jina, Gil Chae, Myeong, Joon Han, Young, Choi, Jun, Hyun Cho, Kwan, Choi, Heenang, Park, Bo Keun, Chung, Taek-Mo, Lee, Woongkyu, Hwan Han, Jeong

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Tunable solid electrolyte interphase formation on SiO anodes using SnO artificial layers for Lithium-ion batteries von Baek, Seong-Ho, Jeong, Young-Min, Chul Shin, Seung, Joon Choi, Byung, Hwan Han, Jeong

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SnO-decorated TiO2 nanoparticle with enhanced photocatalytic performance for methylene blue degradation von Lee, Jae Kwon, Kim, Yoon-Kee, Choi, Byung Joon, Chung, Taek-Mo, Han, Jeong Hwan

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Thermal atomic layer deposition of In2O3 thin films using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H2O von Agbenyeke, Raphael Edem, Jung, Eun Ae, Park, Bo Keun, Chung, Taek-Mo, Kim, Chang Gyoun, Han, Jeong Hwan

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Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition von Kim, Seong Keun, Han, Jeong Hwan, Kim, Gun Hwan, Hwang, Cheol Seong

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Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode von Han, Jeong Hwan, Han, Sora, Lee, Woongkyu, Lee, Sang Woon, Kim, Seong Keun, Gatineau, Julien, Dussarrat, Christian, Hwang, Cheol Seong

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Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications von Lee, Sang Woon, Kwon, Oh Seong, Han, Jeong Hwan, Hwang, Cheol Seong

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Enhancing Penetration Performance and Drug Delivery of Polymeric Microneedles Using Silica Nanoparticle Coatings von Kim, Sohyun, Choi, Hyewon, Jeong, Hyejoong, Ortiz, Wilfredo Méndez, Cheon, Hwayeong, Jeon, Jae Yong, Lee, Jae Hyeon, Han, Jeong Hwan, Stebe, Kathleen J., Lee, Daeyeon, Yoon, Hyunsik

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Atomic-layer-deposited SnO2 on Pt/C prevents sintering of Pt nanoparticles and affects the reaction chemistry for the electrocatalytic glycerol oxidation reaction von Lee, Daewon, Kim, Youngmin, Han, Hyunsu, Won Bae Kim, Chang, Hyunju, Taek-Mo, Chung, Han, Jeong Hwan, Hyun Woo Kim, Kim, Hyung Ju

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Effects of SnO2 layer coated on carbon nanofiber for the methanol oxidation reaction von Kim, Dong Ha, Shin, Dong-Yo, Lee, Young-Geun, An, Geon-Hyoung, Han, Jeong Hwan, Ahn, Hyo-Jin, Choi, Byung Joon

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SnO2 thin films grown by atomic layer deposition using a novel Sn precursor von Choi, Min-Jung, Cho, Cheol Jin, Kim, Kwang-Chon, Pyeon, Jung Joon, Park, Hyung-Ho, Kim, Hyo-Suk, Han, Jeong Hwan, Kim, Chang Gyoun, Chung, Taek-Mo, Park, Tae Joo, Kwon, Beomjin, Jeong, Doo Seok, Baek, Seung-Hyub, Kang, Chong-Yun, Kim, Jin-Sang, Kim, Seong Keun

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Reduction of the Hysteresis Voltage in Atomic‐Layer‐Deposited p‐Type SnO Thin‐Film Transistors by Adopting an Al2O3 Interfacial Layer von Jang, Younjin, Yeu, In Won, Kim, Jun Shik, Han, Jeong Hwan, Choi, Jung‐Hae, Hwang, Cheol Seong

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Novel Heteroleptic Tin(II) Complexes Capable of Forming SnO and SnO2 Thin Films Depending on Conditions Using Chemical Solution Deposition von Han, Seong Ho, Agbenyeke, Raphael Edem, Lee, Ga Yeon, Park, Bo Keun, Kim, Chang Gyoun, Eom, Taeyong, Son, Seung Uk, Han, Jeong Hwan, Ryu, Ji Yeon, Chung, Taek-Mo

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A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memory von Kim, Gun Hwan, Kim, Kyung Min, Seok, Jun Yeong, Lee, Hyun Ju, Cho, Deok-Yong, Han, Jeong Hwan, Hwang, Cheol Seong

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Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time von Han, Jeong Hwan, Lee, Sang Woon, Kim, Seong Keun, Han, Sora, Lee, Woongkyu, Hwang, Cheol Seong, Dussarat, Christian, Gatineau, Julien

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The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application von Seo, Minha, Ho Rha, Sang, Keun Kim, Seong, Hwan Han, Jeong, Lee, Woongkyu, Han, Sora, Seong Hwang, Cheol

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Facile synthesis of AlO x dielectrics via mist-CVD based on aqueous solutions von Oh, Keun-Tae, Kim, Hyo-yeon, Kim, Dong-hyun, Han, Jeong Hwan, Park, Jozeph, Park, Jin-Seong

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