Observation of sub-Bragg diffraction of waves in crystals von Huisman, Simon R, Nair, Rajesh V, Hartsuiker, Alex, Woldering, Léon A, Mosk, Allard P, Vos, Willem L

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Programmable multiport optical circuits in opaque scattering materials von Huisman, Simon R, Huisman, Thomas J, Wolterink, Tom A W, Mosk, Allard P, Pinkse, Pepijn W H

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Programming balanced optical beam splitters in white paint von Huisman, Simon R, Huisman, Thomas J, Goorden, Sebastianus A, Mosk, Allard P, Pinkse, Pepijn W H

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Signature of a three-dimensional photonic band gap observed on silicon inverse woodpile photonic crystals von Huisman, Simon R., Nair, Rajesh V., Woldering, Léon A., Leistikow, Merel D., Mosk, Allard P., Vos, Willem L.

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Controlling single-photon Fock-state propagation through opaque scattering media von Huisman, Thomas J., Huisman, Simon R., Mosk, Allard P., Pinkse, Pepijn W. H.

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Enhanced alignment for lithographic apparatus von GOORDEN SEBASTIANUS ADRIANUS, HUISMAN SIMON R

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DETECTION SYSTEM FOR AN ALIGNMENT SENSOR von HUISMAN SIMON R

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Metrology system and lithography system von GOORDEN SEBASTIANUS ADRIANUS, HUISMAN SIMON R

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Optical system implemented in system for rapid optical inspection of target von GOORDEN SEBASTIANUS ADRIANUS, HUISMAN SIMON R, ROUX SEBASTIEN

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RADIATION SOURCE von KUMAR NISHCHAY, HUISMAN SIMON R

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SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS von POLO ALESSANDRO, HUISMAN SIMON R

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ALIGNMENT METHOD AND APPARATUS von GOORDEN SEBASTIANUS, HUISMAN SIMON R

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METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEASUREMENT ILLUMINATION WITH A CONFIGURABLE ILLUMINATION SPOT DIAMETER von GOORDEN SEBASTIANUS, SOKOLOV SERGEI, HUISMAN SIMON R

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Lithographic apparatus, metrology system and method thereof von MALLIK SIDDHARTHA, SLOTBOOM DAAN MAURITS, HUISMAN SIMON R, LIN YUXIANG

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Level sensor and lithographic apparatus von HUISMAN SIMON R, REIJNDERS MARINUS P

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Overlay measurement system using lock-in amplifier techniques von KREUZER JUSTIN L, HUISMAN SIMON R, SWEERAM MARK

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Measurement system based on intensity order difference, photoetching equipment and method thereof von KREUZER JUSTIN L, GOORDEN SEBASTIANUS ADRIANUS, HUISMAN SIMON R, ALPEGIANI FABIO

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Characterization of a Quantum Light Source Based on Spontaneous Parametric Down-Conversion von Huisman, Thomas J, Huisman, Simon R, Mosk, Allard P, Pinkse, Pepijn W. H

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Programmable multiport optical circuits in opaque scattering materials von Huisman, Simon R, Huisman, Thomas J, Wolterink, Tom A W, Mosk, Allard P, Pinkse, Pepijn W H

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MEASUREMENT SYSTEM AND COHERENT ADJUSTER von GOORDEN SEBASTIANUS ADRIANUS, ERALP MICHAEL, HUISMAN SIMON R, SOKOLOV SERGEY, PELLEMANS HENRICUS PETRUS MARIA, LIAN JIN, KRUSE JUSTIN L

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