CMP process for processing STI on two distinct silicon planes von HU BINGHUA, WOFFORD BILLY ALAN, HUNT KYLE P, HOSEIN ASADD M, NORIEGA LEILA ELVIRA, CHEN XINFEN

Volltext bestellen

Method for selectively etching portions of a layer of material based upon a density or size of semiconductor features located thereunder von Hunt, Kyle, Bhatt, Neel, Hosein, Asadd M, Vialpando, Brian L, Morrison, William R

Volltext bestellen

Method for selectively etching portions of a layer of material based upon a density or size of semiconductor features located thereunder von BHATT NEEL, VIALPANDO BRIAN L, HOSEIN ASADD M, MORRISON WILLIAM R, HUNT KYLE

Volltext bestellen

METHOD FOR SELECTIVELY ETCHING PORTIONS OF A LAYER OF MATERIAL BASED UPON A DENSITY OR SIZE OF SEMICONDUCTOR FEATURES LOCATED THEREUNDER von BHATT NEEL, VIALPANDO BRIAN L, HOSEIN ASADD M, MORRISON WILLIAM R, HUNT KYLE

Volltext bestellen

CMP PROCESS FOR PROCESSING STI ON TWO DISTINCT SILICON PLANES von HU BINGHUA, WOFFORD BILLY ALAN, HUNT KYLE P, HOSEIN ASADD M, NORIEGA LEILA ELVIRA, CHEN XINFEN

Volltext bestellen

Field oxide profile of an isolation region associated with a contact structure of a semiconductor device von JAN DER-E, ARCH JOHN KENNETH, HU BINGHUA, MERCER BETTY SHU, HOSEIN ASADD M, MAHALINGAM PUSHPA, THOMPSON C. MATTHEW

Volltext bestellen

Field oxide profile of an isolation region associated with a contact structure of a semiconductor device von JAN DER-E, ARCH JOHN KENNETH, HU BINGHUA, MERCER BETTY SHU, HOSEIN ASADD M, MAHALINGAM PUSHPA, THOMPSON C. MATTHEW

Volltext bestellen