Formation and stability of silicides on polycrystalline silicon von Colgan, E.G., Gambino, J.P., Hong, Q.Z.

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Self-aligned Ti and Co silicides for high performance sub-0.18 μm CMOS technologies von Kittl, J.A, Hong, Q.Z

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Salicides: materials, scaling and manufacturability issues for future integrated circuits ( invited) von Kittl, J.A, Shiau, W.T, Hong, Q.Z, Miles, D

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Thermal stability of silicide on polycrystalline Si von HONG, Q. Z, HONG, S. Q, D'HEURLE, F. M, HARPER, J. M. E

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Advanced salicides for 0.10 μm CMOS : Co salicide processes with low diode leakage and Ti salicide processes with direct formation of low resistivity C54 TiSi2 von KITTL, J. A, HONG, Q. Z, YANG, H, YU, N, SAMAVEDAM, S. B, GRIBELYUK, M. A

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Interdiffusion and phase formation in Cu(Sn) alloy films von Clevenger, L. A., Arcot, B., Ziegler, W., Colgan, E. G., Hong, Q. Z., d’Heurle, F. M., Cabral, C., Gallo, T. A., Harper, J. M. E.

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Materials aspects of Ti and Co silicidation of narrow polysilicon lines von Kittl, J.A., Hong, Q.Z.

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Solid phase epitaxy of stressed and stress-relaxed Ge-Si alloys von HONG, Q. Z, ZHU, J. G, MAYER, J. W, XIA, W, LAU, S. S

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Thermal reaction between Pt thin films and SixGe1-x alloys von HONG, Q. Z, MAYER, J. W

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Intermetallic formation in copper/magnesium thin films—kinetics, nucleation and growth, and effect of interfacial oxygen von Arcot, B., Murarka, S. P., Clevenger, L. A., Hong, Q. Z., Ziegler, W., Harper, J. M. E.

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The C49 to C54-TiSi2 transformation in self-aligned silicide applications von MANN, R. W, CLEVENGER, L. A, HONG, Q. Z

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Reduction in flux divergence at vias for improved electromigration in multilayered AlCu interconnects von Ting, Larry, Hong, Qi-Zhong, Hsu, Wei-Yung

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The dominant diffusing species and initial phase formation in Al-Cu, Mg-Cu, and Mg-Ni systems von HONG, Q. Z, D'HEURIE, F. M

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Effects of grown-in stress on the metastable solid solubility limits in Sb implanted Ge0.1Si0.9 alloys von Hong, Stella Q., Hong, Q. Z., Mayer, J. W.

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Formation of a C49 TiGe2 phase during annealing a coevaporated Ti0.33Ge0.67 alloy von HONG, Q. Z, BARMAK, K, D'HEURLE, F. M

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Crystallization of amorphous Co-Si alloys von HONG, Q. Z, BARMAK, K, CLEVENGER, L. A

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Thermal stability of Al/barrier/TiSix multilayer structures von LU, J. P, HSU, W. Y, HONG, Q. Z, DIXIT, G. A, LUTTMER, J. D, HAVEMANN, R. H, CHEN, P. J, TSAI, H. L, MAGEL, L. K

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Crystallization of coevaporated and ion-irradiated amorphous CoSi2 von HONG, Q. Z, BARMAK, K, HONG, S. Q, CLEVENGER, L. A

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Regrowth rates and dopant activation of Sb+-implanted Si-Ge alloys von HONG, S. Q, HONG, Q. Z, MAYER, J. W

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Composition control and growth mechanisms in solid phase epitaxy of Ge-Si in GexSi1-x/Pd2Si/Si systems von HONG, Q. Z, MAYER, J. W

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