FUNDMENTAL STUDY OF CONCRETE USING AIR-CRUSHED ELECTRIC ARC FURNACE OXIDIZING SLAG FINE AGGREGATE von WATANABE, Kiyonobu, HIROFUJI, Yoshikazu, KAWASAKI, Akio, FUKUI, Nobuyuki

Volltext

風砕した電気炉酸化スラグ細骨材を用いたコンクリートの基礎的検討 von 渡邉, 清信, 廣藤, 義和, 川崎, 昭郎, 福井, 信行

Volltext

FLOWABILITY MEASUREMENT METHOD, FLOWABILITY MEASUREMENT APPARATUS, AND FLOWABILITY MEASUREMENT SYSTEM von MORITA HIROSHI, KOMADA KENJI, NITTA MINORU, SONOI MAGOFUMI, YAMADA MASAHIRO, SUZUKI YOSHIYUKI, SUMI MANABU, BABA ASAYUKI, MORI AKIHITO, URANO SHINJI, YANAGIDA JUNICHI, HIROFUJI YOSHIKAZU, KISHIMOTO GOTA

Volltext bestellen

CONCRETE TEST PIECE FORMING FORM AND METHOD FOR MANUFACTURE OF TEST PIECE USING THE FORM von WATANABE KIYONOBU, HIROFUJI YOSHIKAZU

Volltext bestellen

Differentiation‐Inducing Factor‐1 Alters Canonical Wnt Signaling and Suppresses Alkaline Phosphatase Expression in Osteoblast‐Like Cell Lines von Matsuzaki, Etsuko, Takahashi‐Yanaga, Fumi, Miwa, Yoshikazu, Hirata, Masato, Watanabe, Yutaka, Sato, Noriharu, Morimoto, Sachio, Hirofuji, Takao, Maeda, Katsumasa, Sasaguri, Toshiyuki

Volltext

Low-energy double-ion-beam deposition system von YOSHIDA, Y, OHNISHI, T, SEKIHARA, T, HIROFUJI, Y

Volltext

PIG-type compact microwave metal ion source von YOSHIDA, Y, SUZUKI, N, ONISHI, T, HIROFUJI, Y

Volltext

Sputtering ion source with simultaneous use of microwave and Penning‐ionization‐gauge discharge von Yoshida, Yoshikazu, Ohnishi, Teruhito, Hirofuji, Yuichi, Ikeda, Tanejiro

Volltext

Ta2O5 film formation by double ion beam method von Ohnishi, Teruhito, Yoshida, Yoshikazu, Hirofuji, Yuichi, Iwasaki, Hiroshi

Volltext

SEMICONDUCTOR DEVICE von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

Volltext bestellen

Semiconductor device von Yamada, Yutaka, Kishida, Takeshi, Tamura, Yoshikazu, Sogawa, Yasuo, Hirofuji, Masanori

Volltext bestellen

Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

Volltext bestellen

SEMICONDUCTOR DEVICE von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

Volltext bestellen

Ta 2O 5 film formation by double ion beam method von Ohnishi, Teruhito, Yoshida, Yoshikazu, Hirofuji, Yuichi, Iwasaki, Hiroshi

Volltext

Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

Volltext bestellen

Low-energy double ion-beam deposition of compound films von Yoshida, Yoshikazu, Ohnishi, Teruhito, Hirofuji, Yuichi, Iwasaki, Hiroshi, Ikeda, Tanejiro

Volltext

Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

Volltext bestellen

SEMICONDUCTOR DEVICE von HIROFUJI, MASANORI, YAMADA, YUTAKA, TAMURA, YOSHIKAZU, KISHIDA, TAKESHI, SOGAWA, YASUO

Volltext bestellen