FUNDMENTAL STUDY OF CONCRETE USING AIR-CRUSHED ELECTRIC ARC FURNACE OXIDIZING SLAG FINE AGGREGATE von WATANABE, Kiyonobu, HIROFUJI, Yoshikazu, KAWASAKI, Akio, FUKUI, Nobuyuki

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風砕した電気炉酸化スラグ細骨材を用いたコンクリートの基礎的検討 von 渡邉, 清信, 廣藤, 義和, 川崎, 昭郎, 福井, 信行

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FLOWABILITY MEASUREMENT METHOD, FLOWABILITY MEASUREMENT APPARATUS, AND FLOWABILITY MEASUREMENT SYSTEM von MORITA HIROSHI, KOMADA KENJI, NITTA MINORU, SONOI MAGOFUMI, YAMADA MASAHIRO, SUZUKI YOSHIYUKI, SUMI MANABU, BABA ASAYUKI, MORI AKIHITO, URANO SHINJI, YANAGIDA JUNICHI, HIROFUJI YOSHIKAZU, KISHIMOTO GOTA

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Ta 2O 5 film formation by double ion beam method von Ohnishi, Teruhito, Yoshida, Yoshikazu, Hirofuji, Yuichi, Iwasaki, Hiroshi

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CONCRETE TEST PIECE FORMING FORM AND METHOD FOR MANUFACTURE OF TEST PIECE USING THE FORM von WATANABE KIYONOBU, HIROFUJI YOSHIKAZU

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Differentiation‐Inducing Factor‐1 Alters Canonical Wnt Signaling and Suppresses Alkaline Phosphatase Expression in Osteoblast‐Like Cell Lines von Matsuzaki, Etsuko, Takahashi‐Yanaga, Fumi, Miwa, Yoshikazu, Hirata, Masato, Watanabe, Yutaka, Sato, Noriharu, Morimoto, Sachio, Hirofuji, Takao, Maeda, Katsumasa, Sasaguri, Toshiyuki

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Low-energy double-ion-beam deposition system von YOSHIDA, Y, OHNISHI, T, SEKIHARA, T, HIROFUJI, Y

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PIG-type compact microwave metal ion source von YOSHIDA, Y, SUZUKI, N, ONISHI, T, HIROFUJI, Y

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Sputtering ion source with simultaneous use of microwave and Penning‐ionization‐gauge discharge von Yoshida, Yoshikazu, Ohnishi, Teruhito, Hirofuji, Yuichi, Ikeda, Tanejiro

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Ta2O5 film formation by double ion beam method von Ohnishi, Teruhito, Yoshida, Yoshikazu, Hirofuji, Yuichi, Iwasaki, Hiroshi

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SEMICONDUCTOR DEVICE von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

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Semiconductor device von Yamada, Yutaka, Kishida, Takeshi, Tamura, Yoshikazu, Sogawa, Yasuo, Hirofuji, Masanori

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Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

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SEMICONDUCTOR DEVICE von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

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Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

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Low-energy double ion-beam deposition of compound films von Yoshida, Yoshikazu, Ohnishi, Teruhito, Hirofuji, Yuichi, Iwasaki, Hiroshi, Ikeda, Tanejiro

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Semiconductor device von YAMADA YUTAKA, KISHIDA TAKESHI, SOGAWA YASUO, TAMURA YOSHIKAZU, HIROFUJI MASANORI

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SEMICONDUCTOR DEVICE von HIROFUJI, MASANORI, YAMADA, YUTAKA, TAMURA, YOSHIKAZU, KISHIDA, TAKESHI, SOGAWA, YASUO

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Up-regulation of Axin2 by dexamethasone promotes adipocyte differentiation in ROB-C26 mesenchymal progenitor cells von Naito, Masako, Mikami, Yoshikazu, Takagi, Minoru, Takahashi, Tomihisa

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Investigation on concentration characteristics of ozone micro-bubbles fixed in ice and ozone gas released from ice von Matsumoto, Koji, Furuya, Koji, Zhang, Shiying, Teraoka, Yoshikazu, Tsubaki, Daisuke, Furudate, Yuta

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