Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet... von Kozawa, Takahiro, Hirayama, Taku

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Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists von Kozawa, Takahiro, Hirayama, Taku

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Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists von Kozawa, Takahiro, Hirayama, Taku

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Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists von Kozawa, Takahiro, Hirayama, Taku

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Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography von Komuro, Yoshitaka, Kawana, Daisuke, Hirayama, Taku, Ohomori, Katsumi, Kozawa, Takahiro

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Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation von Komuro, Yoshitaka, Kawana, Daisuke, Hirayama, Taku, Ohmori, Katsumi, Kozawa, Takahiro

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Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists von Hirayama, Taku, Shiono, Daiju, Matsumaru, Shogo, Ogata, Toshiyuki, Hada, Hideo, Onodera, Junichi, Arai, Tadashi, Sakamizu, Toshio, Yamaguchi, Atsuko, Shiraishi, Hiroshi, Fukuda, Hiroshi, Ueda, Mitsuru

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New Photoresist Based on Amorphous Low Molecular Weight Polyphenols von Hirayama, Taku, Daiju, Shiono, Hada, Hideo, Onodera, Junichi, Ueda, Mitsuru

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Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance von Yamaguchi, Atsuko, Fukuda, Hiroshi, Arai, Tadashi, Yamamoto, Jiro, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi

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Performance of molecular resist based on polyphenol in EUV lithography von Oizumi, Hiroaki, Kumasaka, Fumiaki, Tanaka, Yuusuke, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao

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Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control von Shiono, Daiju, Hada, Hideo, Hirayama, Taku, Onodera, Junichi, Watanabe, Takeo, Kinoshita, Hiroo

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Depth profile and line-edge roughness of partially O-1-ethoxyethylated low molecular weight amorphous polyphenol and poly(p-hydroxystyrene) base resists for electron-beam lithograp... von Hirayama, Taku, Shiono, Daiju, Onodera, Junichi, Yamaguchi, Atsuko, Fukuda, Hiroshi

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Patterning capability of new molecular resist in EUV lithography von Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao

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Evaluation of New Molecular Resist for EUV Lithography von Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atusko, Nishiyama, Iwao

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Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography von Shiono, Daiju, Hirayama, Taku, Kasai, Kohei, Hada, Hideo, Onodera, Junichi, Arai, Tadashi, Yamaguchi, Atsuko, Shiraishi, Hiroshi, Fukuda, Hiroshi

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Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography von Hada, Hideo, Hirayama, Taku, Shiono, Daiju, Onodera, Junichi, Watanabe, Takeo, Lee, Seung Yoon, Kinoshita, Hiroo

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Negative-Tone Polyphenol Resist using Intramolecular-Esterification Reaction for sub-50 nm Lithography von Kojima, Kyoko, Hattori, Takashi, Fukuda, Hiroshi, Hirayama, Taku, Shiono, Daiji, Hada, Hideo, Onodera, Junichi

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Evaluation of Resist Capability for EUV Lithography von Oizumi, Hiroaki, Tanaka, Yusuke, Shiono, Daiji, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao

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Effects of Protecting Group of Fluoroalcohol on Lithographic Performance von Ogata, Toshiyuki, Matsumaru, Shogo, Hirayama, Taku, Shiono, Daiju, Iwai, Takeshi, Hada, Hideo, Shirai, Masamitsu

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TURBINENSCHAUFEL UND GASTURBINE von Hirayama, Taku, Ito, Ryuta

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