Remote Atmospheric-Pressure Plasma Activation of the Surfaces of Polyethylene Terephthalate and Polyethylene Naphthalate von Gonzalez, E, Barankin, M. D, Guschl, P. C, Hicks, R. F

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Effect of Twinning on the Photoluminescence and Photoelectrochemical Properties of Indium Phosphide Nanowires Grown on Silicon (111) von Woo, Robyn L, Xiao, Rui, Kobayashi, Yoji, Gao, Li, Goel, Niti, Hudait, Mantu K, Mallouk, Thomas E, Hicks, R. F

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Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma von Moravej, M, Yang, X, Barankin, M, Penelon, J, Babayan, S E, Hicks, R F

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Plasma-enhanced chemical vapor deposition of zinc oxide at atmospheric pressure and low temperature von Barankin, M.D., Gonzalez II, E., Ladwig, A.M., Hicks, R.F.

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Comparison of an atmospheric pressure, radio-frequency discharge operating in the α and γ modes von Yang, X, Moravej, M, Nowling, G R, Babayan, S E, Panelon, J, Chang, J P, Hicks, R F

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Physics of high-pressure helium and argon radio-frequency plasmas von Moravej, M., Yang, X., Nowling, G. R., Chang, J. P., Hicks, R. F., Babayan, S. E.

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Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source von Park, Jaeyoung, Henins, I., Herrmann, H. W., Selwyn, G. S., Hicks, R. F.

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Effect of precursor flux on compositional evolution in InP1-xSbx nanowires grown via self-catalyzed vapor-liquid-solid process von NGO, Chilan, HAILONG ZHOU, MECKLENBURG, Matthew, POZUELO, Marta, REGAIN, B. C, XIAO, Q. F, SHENOY, V. B, HICKS, R. F, KODAMBAKA, S

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Deposition of silicon dioxide films with a non-equilibrium atmospheric-pressure plasma jet von Babayan, S E, Jeong, J Y, Schütze, A, Tu, V J, Moravej, Maryam, Selwyn, G S, Hicks, R F

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Etching materials with an atmospheric-pressure plasma jet von Jeong, J Y, Babayan, S E, Tu, V J, Park, J, Henins, I, Hicks, R F, Selwyn, G S

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Atmospheric Plasma Deposition of Coatings Using a Capacitive Discharge Source von Moravej, M., Hicks, R. F.

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Chamberless plasma deposition of glass coatings on plastic von Nowling, G R, Yajima, M, Babayan, S E, Moravej, M, Yang, X, Hoffman, W, Hicks, R F

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Plasma enhanced chemical vapour deposition of hydrogenated amorphous silicon at atmospheric pressure von Moravej, M, Babayan, S E, Nowling, G R, Yang, X, Hicks, R F

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Deposition of silicon dioxide films with an atmospheric-pressure plasma jet von Babayan, S E, Jeong, J Y, Tu, V J, Park, J, Selwyn, G S, Hicks, R F

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Selective area metalorganic vapor-phase epitaxy of gallium arsenide on silicon von Cheng, S.F., Gao, L., Woo, R.L., Pangan, A., Malouf, G., Goorsky, M.S., Wang, K.L., Hicks, R.F.

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Zincblende to wurtzite transition during the self-catalyzed growth of InP nanostructures von Pozuelo, M., Prikhodko, S.V., Grantab, R., Zhou, H., Gao, L., Sitzman, S.D., Gambin, V., Shenoy, V.B., Hicks, R.F., Kodambaka, S.

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Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure von Nowling, G R, Babayan, S E, Jankovic, V, Hicks, R F

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An atmospheric pressure plasma source von Park, Jaeyoung, Henins, I., Herrmann, H. W., Selwyn, G. S., Jeong, J. Y., Hicks, R. F., Shim, D., Chang, C. S.

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Plasma jets and plasma bullets von Kong, M G, Ganguly, B N, Hicks, R F

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High stability of atmospheric pressure plasmas containing carbon tetrafluoride and sulfur hexafluoride von Yang, X, Moravej, M, Babayan, S E, Nowling, G R, Hicks, R F

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