Mid-IR broadband supercontinuum generation from a suspended silicon waveguide von Kou, Rai, Hatakeyama, Taiki, Horng, Jason, Kang, Ji-Hun, Wang, Yuan, Zhang, Xiang, Wang, Feng

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High Quality Factor Graphene Resonator Fabrication Using Resist Shrinkage-Induced Strain von Oshidari, Yuta, Hatakeyama, Taiki, Kometani, Reo, Warisawa, Shin'ichi, Ishihara, Sunao

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Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor deposition von Hatakeyama, Taiki, Kometani, Reo, Warisawa, Shin’ichi, Ishihara, Sunao

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Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithography von Kometani, Reo, Hatakeyama, Taiki, Kuroda, Kouhei, Warisawa, Shin’ichi, Ishihara, Sunao

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Adiabatic elimination-based coupling control in densely packed subwavelength waveguides von Mrejen, Michael, Suchowski, Haim, Hatakeyama, Taiki, Wu, Chihhui, Feng, Liang, O’Brien, Kevin, Wang, Yuan, Zhang, Xiang

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Experimental Realization of Two Decoupled Directional Couplers in a Subwavelength Packing by Adiabatic Elimination von Mrejen, Michael, Suchowski, Haim, Hatakeyama, Taiki, Wang, Yuan, Zhang, Xiang

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Control of Directional Coupling Based on Adiabatic Elimination von Hatakeyama, Taiki, Mrejen, Michael, Suchowski, Haim, Wang, Yuan, Zhang, Xiang

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Broadband Mid-IR supercontinuum generation from air-cladding silicon waveguide von Kou, Rai, Hatakeyama, Taiki, Horng, Jason, Kang, Jihun, Zhang, Xiang, Wang, Feng

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DIRECTIONAL SELECTIVE FILL FOR SILICON GAP FILL PROCESSES von LIU, Biao, MA, Qiang, HATAKEYAMA, Taiki, CITLA, Bhargav S, NEMANI, Srinivas D

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DIRECTIONAL SELECTIVE FILL FOR SILICON GAP FILL PROCESSES von Ma, Qiang, Hatakeyama, Taiki, Liu, Biao, Nemani, Srinivas D, Citla, Bhargav S

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Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching von Payyapilly, Jairaj Joseph, Hatakeyama, Taiki, Koseki, Shinichi, Watanabe, Hikaru, Kang, Sean S, Shimizu, Daisuke

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METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES von SHIMIZU, Daisuke, HATAKEYAMA, Taiki, KAWASAKI, Katsumasa, KANG, Sean, ZHANG, Chunlei

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Methods and apparatus for etching semiconductor structures von Kawasaki, Katsumasa, Hatakeyama, Taiki, Zhang, Chunlei, Kang, Sean S, Shimizu, Daisuke

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METHODS AND APPARATUS FOR IN-SITU PROTECTION LINERS FOR HIGH ASPECT RATIO REACTIVE ION ETCHING von KOSEKI, Shinichi, SHIMIZU, Daisuke, HATAKEYAMA, Taiki, PAYYAPILLY, Jairaj Joseph, WATANABE, Hikaru, KANG, Sean S

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METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES von SHIMIZU, Daisuke, HATAKEYAMA, Taiki, KAWASAKI, Katsumasa, ZHANG, Chunlei, KANG, Sean S

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Methods and apparatus for etching semiconductor structures von Kawasaki, Katsumasa, Hatakeyama, Taiki, Zhang, Chunlei, Kang, Sean S, Shimizu, Daisuke

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MULTIZONE FLOW DISTRIBUTION SYSTEM von Hatakeyama, Taiki, Zhang, Chunlei, SHIMIZU, DAISUKE, Shoji, Sergio F, Kang, Sean S

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METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES von ZHANG, CHUNLEI, KAWASAKI, KATSUMASA, KANG, SEAN S, SHIMIZU, DAISUKE, HATAKEYAMA, TAIKI

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Methods and apparatus for etching semiconductor structures von Kawasaki, Katsumasa, Hatakeyama, Taiki, Zhang, Chunlei, Kang, Sean S, Shimizu, Daisuke

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Active coupling control in densely packed subwavelength waveguides via dark mode von Suchowski, Haim, Mrejen, Michael, Hatakeyama, Taiki, Wu, Chihhui, Feng, Liang, OBrien, Kevin, Wang, Yuan, Zhang, Xiang

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