SHOWERHEAD WITH HOLE SIZES FOR RADICAL SPECIES DELIVERY von HART, Kyle Watt, MILLER, Aaron Blake, BHIMARASETTI, Gopinath

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MULTI-CHANNEL PRECURSOR DELIVERY SYSTEM von RUSSELL, Shoa Allene, HART, Kyle Watt, PREMAKUMAR, Harish Kumar, FISHER, Adam, LETOURNEAU, Steven Payonk, GUPTA, Awnish, RAKESH, Chandrashekar

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SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING SYSTEMS FOR IMPROVING DEPOSITION THICKNESS UNIFORMITY von JEON, Eli, CHEN, Philip, HART, Kyle Watt, AGNEW, Douglas Walter, PODDAR, Debotosh, BOATRIGHT, Daniel, SUBRAMANYA, Kashyap

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DOME SHAPED CHAMBER FOR GENERATING IN-SITU CLEANING PLASMA von THILAGARAJ, Mohan, BATZER, Rachel E, KESHAV, Pramod, HART, Kyle Watt, WANG, Yuxi, GUO, Tongtong, MADINENI, Damodar Aravind, GONG, Bo, HOHN, Geoffrey, DAS, Shoudho

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라디칼 종 전달을 위한 구멍 크기를 갖는 샤워헤드 von BHIMARASETTI GOPINATH, MILLER AARON BLAKE, HART KYLE WATT

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Showerhead with hole sizes for radical species delivery von HART, KYLE WATT, MILLER, AARON BLAKE, BHIMARASETTI, GOPINATH

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증착 두께 균일성을 개선하기 위한 샤워헤드 어셈블리 및 기판 프로세싱 시스템들 von JEON ELI, PODDAR DEBOTOSH, AGNEW DOUGLAS WALTER, SUBRAMANYA KASHYAP, BOATRIGHT DANIEL, CHEN PHILIP, HART KYLE WATT

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DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN von GANESAN, Jeya Prakash, BATZER, Rachel E, HAUSMANN, Dennis M, GUO, Tongtong, FUSTER, Hector Aaron, TA, Phuong Kim, AUSTIN, Dustin Zachary, VOLOSSKIY, Boris, JUAREZ, Francisco J, MCKERROW, Andrew John, EDMONDSON, Bryce Isaiah, KWAN, Matthew Palmer, HART, Kyle Watt, WANG, Yuxi, TENCE, David Alan, ERICKSON, Ann, KHOJASTEH, Malak, GONG, Bo, DRAPER, Emile C, JENG, Esther

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Showerhead assembly and substrate processing systems for improving deposition thickness uniformity von JEON, ELI, CHEN, PHILIP, SUBRAMANYA, KASHYAP, HART, KYLE WATT, BOATRIGHT, DANIEL, PODDAR, DEBOTOSH, AGNEW, DOUGLAS WALTER

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Showerhead, showerhead assembly and substrate processing systems for improving deposition thickness uniformity von JEON, ELI, CHEN, PHILIP, SUBRAMANYA, KASHYAP, HART, KYLE WATT, BOATRIGHT, DANIEL, PODDAR, DEBOTOSH, AGNEW, DOUGLAS WALTER

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Dome shaped chamber for generating in-situ cleaning plasma von HOHN, GEOFFREY, WANG, YU-XI, HART, KYLE WATT, GUO, TONG-TONG, GONG, BO, DAS, SHOUDHO, KESHAV, PRAMOD, THILAGARAJ, MOHAN, BATZER, RACHEL E, MADINENI, DAMODAR ARAVIND

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Deposition of metal-containing films and chamber clean von WANG, YU-XI, ERICKSON, ANN, HAUSMANN, DENNIS M, TENCE, DAVID ALAN, MCKERROW, ANDREW JOHN, KHOJASTEH, MALAK, GONG, BO, GANESAN, JEYA PRAKASH, DRAPER, EMILE C, BATZER, RACHEL E, AUSTIN, DUSTIN ZACHARY, JENG, ESTHER, EDMONDSON, BRYCE ISAIAH, FUSTER, HECTOR AARON, VOLOSSKIY, BORIS, HART, KYLE WATT, GUO, TONG-TONG, KWAN, MATTHEW PALMER, JUAREZ, FRANCISCO J

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