A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography von Cho, Kayoko, Dinh, Cong Que, Tomori, Hikari, Nagahara, Seiji, Hara, Arisa, Fujimoto, Seiji, Muramatsu, Makoto

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Understanding of Interactive Behaviors between Resist Film and Under-layer von Yaegashi, Hidetami, Hara, Arisa, Okada, Soichiro, Shimura, Satoru

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Randomness of Polymer Microstructure in the Resist Film as Shot Noise von Muramatsu, Makoto, Hara, Arisa, Shimura, Satoru, Yaegashi, Hidetami

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Characterization and Control of Hole Missing Defect in EUV Patterning von Yaegashi, Hidetami, Hara, Arisa, Okada, Soichiro, Shimura, Satoru

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Isoform-specific distribution of 14–3-3 proteins in the hippocampus of streptozotocin-induced diabetic rats von Sasaki-Hamada, Sachie, Hara, Arisa, Tainaka, Yume, Satoh, Sho, Oka, Jun-Ichiro, Ishibashi, Hitoshi

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Enabled Scaling Capability with Self-aligned Multiple patterning process von Yaegashi, Hidetami, Oyama, Kenichi, Yamauchi, Shoichi, Hara, Arisa, Natori, Sakurako, Yamato, Masatoshi

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Expression of matrix metalloproteinase-1 and connexin-43 in oral cancer cell lines von Hara, Arisa, Kokubu, Eitoyo, Matsuzaka, Kenichi, Inoue, Takashi

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Opportunities and Challenges in Scaling von Yaegashi, Hidetami, Oyama, Kenichi, Yamauchi, Shoichi, Hara, Arisa, Natori, Sakurako, Yamato, Masatoshi

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Important Challenge for Optical Lithography Extension utilizing Double Patterning Process von Yaegashi, Hidetami, Oyama, Kenichi, Yabe, Kazuo, Yamauchi, Shoichi, Hara, Arisa, Natori, Sakuraoka

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Understanding the Significance of Local Variability in Defect-Aware Process Windows von Maslow, Mark John, Yaegashi, Hidetami, Frommhold, Andreas, Hara, Arisa, Cerbu, Dorin

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Fabrication of Silicon Pillar with 25 nm Half Pitch Using New Multiple Double Patterning Technique von Kushibiki, Masato, Hara, Arisa, Nishimura, Eiichi, Endoh, Tetsuo

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(Invited) Optical Lithography Extension Technique with Multiple-Patterning Process von Yaegashi, Hidetami, Oyama, Kenichi, Hara, Arisa, Natori, Sakurako, Yamauchi, Shohei, Yamato, Masatoshi

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Fabrication of Silicon Pillar with 25 nm Half Pitch Using New Multiple Double Patterning Technique von Kushibiki, Masato, Hara, Arisa, Nishimura, Eiichi, Endoh, Tetsuo

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(Invited) Important Challenges in Double Patterning Processes von Yaegashi, Hidetami, Oyama, Kenichi, Hara, Arisa, Natori, Sakurako, Yamauchi, Shohei, Yamato, Masatoshi

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Epithelial Cell Rests of Malassez Modulate Cell Proliferation, Differentiation and Apoptosis via Gap Junctional Communication under Mechanical Stretching in vitro von Haku, Ken, Muramatsu, Takashi, Hara, Arisa, Kikuchi, Akira, Hashimoto, Sadamitsu, Inoue, Takashi, Shimono, Masaki

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Enabled Scaling in Multiple-patterning von Yaegashi, Hidetami, Oyama, Kenichi, Yamauchi, Shohei, Hara, Arisa, Natori, Sakurako, Yamato, Masatoshi, Okabe, Noriaki, Koike, Kyohei

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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM von FUJIMOTO Seiji, HARA Arisa, ONO Kenta, NISHIZUKA Tetsuya, HONDA Masanobu, SAKAGAMI Takuya, KUMAKURA Sho, OKADA Soichiro, NAKANE Yuta

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マルチパターニングによる微細加工の可能性 von 八重樫, 英民, 小山, 賢一, 山内, 祥平, 原, 亜梨沙, 名執, 桜子, 大和, 雅俊, 岡部, 憲明, 小池, 恭平

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Assessment of a cancer genomic profile test for patients with metastatic breast cancer von Fukada, Ippei, Mori, Seiichi, Hayashi, Naomi, Hosonaga, Mari, Yamazaki, Masumi, Wang, Xiaofei, Kawai, Saori, Inagaki, Lina, Ozaki, Yukinori, Kobayashi, Kokoro, Hara, Fumikata, Kobayashi, Takayuki, Ueki, Arisa, Osako, Tomo, Tonooka, Akiko, Takeuchi, Kengo, Ueno, Takayuki, Takano, Toshimi, Ohno, Shinji, Takahashi, Shunji

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Gender disparities among prestigious biomedical award recipients in Japan: A cross sectional study von Hakariya, Hayase, Ikejiri, Tatsuki, Hakariya, Arisa, Hara, Mayumi

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