DETERMINATION OF COMPLEX DIELECTRIC FUNCTIONS OF ION-IMPLANTED AND IMPLANTED-ANNEALED AMORPHOUS-SILICON BY SPECTROSCOPIC ELLIPSOMETRY von FRIED, M, LOHNER, T, AARNINK, WAM, HANEKAMP, LJ, VANSILFHOUT, A

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NONDESTRUCTIVE DETERMINATION OF DAMAGE DEPTH PROFILES IN ION-IMPLANTED SEMICONDUCTORS BY SPECTROSCOPIC ELLIPSOMETRY USING DIFFERENT OPTICAL-MODELS von FRIED, M, LOHNER, T, AARNINK, WAM, HANEKAMP, LJ, VANSILFHOUT, A

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On the oxide formation on stainless steels AISI 304 and incoloy 800H investigated with XPS von Langevoort, J.C., Sutherland, I., Hanekamp, L.J., Gellings, P.J.

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Ion-implantation-caused special damage profiles determined by spectroscopic ellipsometry in crystalline and in relaxed (annealed) amorphous silicon von Lohner, T., Fried, M., Gyulai, J., Vedam, K., Nguyen, N.V., Hanekamp, L.J., van Silfhout, A.

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Nondestructive characterization of nitrogen-implanted silicon-on-insulator structures by spectroscopic ellipsometry von FRIED, M, LOHNER, T, DE NIJS, J. M. M, VAN SILFHOUT, A, HANEKAMP, L. J, LACZIK, Z, KHANH, N. Q, GYULAI, J

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Multiple reflections in an optical retarder investigated by spectroscopic transmission ellipsometry von Hanekamp, L.J.

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Composition and thickness of surface layer on molybdenum tips for scanning tunnelling microscopy (STM) studied by SEM/AES/(AR)XPS von Lisowski, W., Van Den Berg, A. H. J., Hanekamp, L. J., Van Silfhout, A.

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Spectroscopic ellipsometric investigation of clean and oxygen covered copper single crystal surfaces von Hanekamp, L.J., Lisowski, W., Bootsma, G.A.

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Integrated automatic modular measuring system von Baikie, I. D., van der Werf, K. O., Hanekamp, L. J.

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Surface and bulk magnetic behaviour of sputtered CoCr films von Hemmes, K, Lisowski, W, Lodder, J C, Hanekamp, L J, Popma, Th J A

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Characterization of tungsten tips for STM by SEM/AES/XPS von Lisowski, W., van den Berg, A. H. J., Kip, G. A. M., Hanekamp, L. J.

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Ion-implantation induced anomalous surface amorphization in silicon von Lohner, T., Kótai, E., Khánh, N.Q., Tóth, Z., Fried, M., Vedam, K., Nguyen, N.V., Hanekamp, L.J., van Silfhout, A.

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Spectroscopic ellipsometric investigation of the clean and oxygen exposed Ni(110) surface von Hanekamp, L.J., Brader, S.J.H., Bootsma, G.A.

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The behaviour of secondary electrons from Ni (110) upon oxygen adsorption von Hanekamp, LJ, Brader, SJH

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Comparative investigation of damage induced by diatomic and monoatomic ion implantation in silicon von Lohner, T., Tóth, Z., Fried, M., Khánh, N.Q., Gen Qing Yang, Lin Chen Lu, Shichang, Zou, Hanekamp, L.J., van Silfhout, A., Gyulai, J.

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On the kinetics of oxidation of austenitic stainless steels AISI 304 and incoloy 800H von Langevoort, J.C., Hanekamp, L.J., Gellings, P.J.

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DISTRIBUTION AND THICKNESS OF THE SURFACE CONTAMINATIONS ON STM TUNGSTEN TIPS, STUDIED BY AES SEM AND ARXPS von LISOWSKI, WF, VANDENBERG, AHJ, HANEKAMP, LJ, VANSILFHOUT, A

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In-depth compositional analysis of ceramic (Bi2O3)0.75(Er2O3)0.25 by AES and XPS von HANEKAMP, L. J, VAN DEN BERG, A. H. J, BOUWMEESTER, H. J. M, SASSE, A. G. B. M, KRUIDHOF, H

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Effects on ellipsometric parameters caused by heat treatment of silicon (111) surface von Kono, S., Hanekamp, L.J., van Silfhout, A.

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An AES and LEED study of carbon and oxygen sorption on copper surfaces von Oda, O., Hanekamp, L.J., Bootsma, G.A.

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