New Formulas for Evaluation of Cyclohexanol Solidification on Substrates with Surface Nanostructures von Hanawa, Yosuke, Zhang, Jianliang, Sasmito, Agus P., Xu, Minghan, Akhtar, Saad, Mohit, Mohammaderfan, Yoshida, Junichi, Sawada, Koichi, Sasaki, Yuta, Sakuma, Atsushi

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Multi-scale analysis for solidification of phase change materials (PCMs): Experiments and modeling von Xu, Minghan, Hanawa, Yosuke, Akhtar, Saad, Sakuma, Atsushi, Zhang, Jianliang, Yoshida, Junichi, Sanada, Masakazu, Sasaki, Yuta, Sasmito, Agus P.

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Experimental and Theoretical Studies on the Solidification of Cyclohexane on Silicon (Si) Substrate von Mohit, Mohammaderfan, Xu, Minghan, Hanawa, Yosuke, Zhang, Jianliang, Yoshida, Junichi, Sawada, Koichi, Sasaki, Yuta, Sakuma, Atsushi, Sasmito, Agus P.

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Kinetics formulation for Two-Dimensional Growth Behavior of Water/Ice Interface on Si Substrate von Hanawa, Yosuke, Zhang, Jianliang, Sasmito, Agus P., Xu, Minghan, Akhtar, Saad, Mohit, Mohammaderfan, Yoshida, Junichi, Sawada, Koichi, Sasaki, Yuta, Sakuma, Atsushi

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Breakthrough of Sublimation Drying by Liquid Phase Deposition von Fujiwara, Naozumi, Kato, Masahiko, Sasaki, Yuta, Hanawa, Yousuke, Yamaguchi, Yu, Takahashi, Hiroaki, Otsuji, Masayuki

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The mixed evacuation problem von Hanawa, Yosuke, Higashikawa, Yuya, Kamiyama, Naoyuki, Katoh, Naoki, Takizawa, Atsushi

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The Mixed Evacuation Problem von Hanawa, Yosuke, Higashikawa, Yuya, Kamiyama, Naoyuki, Katoh, Naoki, Takizawa, Atsushi

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SUBSTRATE TREATING METHOD, SUBSTRATE TREATING LIQUID AND SUBSTRATE TREATING APPARATUS von SASAKI, Yuta, HANAWA, Yosuke

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Substrate processing liquid for etching a metal layer, substrate processing method and substrate processing apparatus von Ueda, Dai, Hanawa, Yosuke

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Model potential of dimer system and coherence length of electron injected by scanning tunneling microscope on Ge(0 0 1) surface von Kawai, Hiroshi, Yoshimoto, Yoshihide, Narikiyo, Osamu, Hanawa, Yosuke, Imamura, Akimasa

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SUBSTRATE TREATMENT METHOD AND TREATMENT LIQUID EVALUATION METHOD von KUNIEDA, Shogo, SASAKI, Yuta, HANAWA, Yosuke

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Substrate drying method and substrate drying apparatus von Hanawa, Yosuke, Sasaki, Yuta

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SUBSTRATE PROCESSING LIQUID, SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS von UEDA, Dai, HANAWA, Yosuke

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Substrate treating method, substrate treating liquid and substrate treating apparatus von Hanawa, Yosuke, Sasaki, Yuta

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SUBSTRATE TREATING METHOD, SUBSTRATE TREATING APPARATUS, AND TREATMENT LIQUID von KUNIEDA, Shogo, SASAKI, Yuta, HANAWA, Yosuke

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SUBSTRATE TREATING METHOD AND TREATMENT LIQUID von KUNIEDA, Shogo, SASAKI, Yuta, HANAWA, Yosuke

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SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS von HARUMOTO, Akiko, UEDA, Dai, HANAWA, Yosuke

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SUBSTRATE TREATING METHOD, SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING LIQUID von KUNIEDA, Shogo, SASAKI, Yuta, HANAWA, Yosuke

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SUBSTRATE DRYING METHOD AND SUBSTRATE DRYING APPARATUS von SASAKI, Yuta, HANAWA, Yosuke

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Substrate treating apparatus and substrate treating method von Hanawa, Yosuke, Sasaki, Yuta

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