Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials von Kim, Myungwoong, Safron, Nathaniel S, Han, Eungnak, Arnold, Michael S, Gopalan, Padma

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Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains von Han, Eungnak, Stuen, Karl O, La, Young-Hye, Nealey, Paul F, Gopalan, Padma

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Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats von Liu, Chi-Chun, Han, Eungnak, Onses, M. Serdar, Thode, Christopher J, Ji, Shengxiang, Gopalan, Padma, Nealey, Paul F

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Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions von Han, Eungnak, Stuen, Karl O, Leolukman, Melvina, Liu, Chi-Chun, Nealey, Paul F, Gopalan, Padma

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One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers von Hirai, Tomoyasu, Leolukman, Melvina, Liu, Chi Chun, Han, Eungnak, Kim, Yun Jun, Ishida, Yoshihito, Hayakawa, Teruaki, Kakimoto, Masa-aki, Nealey, Paul F., Gopalan, Padma

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Cross-Linked Random Copolymer Mats As Ultrathin Nonpreferential Layers for Block Copolymer Self-Assembly von Han, Eungnak, Gopalan, Padma

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Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates von Han, Eungnak, Kang, Huiman, Liu, Chi-Chun, Nealey, Paul F., Gopalan, Padma

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Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-b-methyl methacrylate) Diblock Copolymers von Widin, Joan M, Kim, Myungwoong, Schmitt, Adam K, Han, Eungnak, Gopalan, Padma, Mahanthappa, Mahesh K

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Electronic Transport and Raman Scattering in Size-Controlled Nanoperforated Graphene von Kim, Myungwoong, Safron, Nathaniel S, Han, Eungnak, Arnold, Michael S, Gopalan, Padma

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Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography von Han, Eungnak, Leolukman, Melvina, Kim, Myungwoong, Gopalan, Padma

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Chemical Patterns from Surface Grafted Resists for Directed Assembly of Block Copolymers von Han, Eungnak, Kim, Myungwoong, Gopalan, Padma

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A Dual Functional Layer for Block Copolymer Self-Assembly and the Growth of Nanopatterned Polymer Brushes von Sweat, Daniel P, Kim, Myungwoong, Yu, Xiang, Schmitt, Samantha K, Han, Eungnak, Choi, Jonathan W, Gopalan, Padma

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Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features von Liu, Chi-Chun, Ramírez-Hernández, Abelardo, Han, Eungnak, Craig, Gordon S. W, Tada, Yasuhiko, Yoshida, Hiroshi, Kang, Huiman, Ji, Shengxiang, Gopalan, Padma, de Pablo, Juan J, Nealey, Paul F

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Interplay of surface chemical composition and film thickness on graphoepitaxial assembly of asymmetric block copolymers von Kim, Myungwoong, Han, Eungnak, Sweat, Daniel P., Gopalan, Padma

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Integration of block copolymer directed assembly with 193 immersion lithography von Liu, Chi-Chun, Nealey, Paul F., Raub, Alex K., Hakeem, Philip J., Brueck, Steve R. J., Han, Eungnak, Gopalan, Padma

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Interplay of surface chemical composition and film thickness on graphoepitaxial assembly of asymmetric block copolymersElectronic supplementary information (ESI) available: Supplem... von Kim, Myungwoong, Han, Eungnak, Sweat, Daniel P, Gopalan, Padma

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Cyclopolymerization of α-Methylbenzyl Dipropargylamine by Transition Metal Catalysts von Gal, Yeong-Soon, Lee, Won-Chul, Jin, Sung-Ho, Lim, Kwon Taek, Jang, Sang-Hee, Lyoo, Won Seok, Han, Eungnak, Kim, Sang Youl

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Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation von Han, E., In, I., Park, S.-M., La, Y.-H., Wang, Y., Nealey, P. F., Gopalan, P.

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Degree of Perfection and Pattern Uniformity in the Directed Assembly of Cylinder-Forming Block Copolymer on Chemically Patterned Surfaces von Kang, Huiman, Craig, Gordon S. W, Han, Eungnak, Gopalan, Padma, Nealey, Paul F

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INTEGRATED CIRCUIT (IC) DEVICE WITH MULTI-PITCH PATTERN FABRICATED THROUGH CROSS-LINKABLE BLOCK COPOLYMER von Gstrein, Florian, Singh, Gurpreet, Han, Eungnak

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