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  1. 1
    METHOD AND APPARATUS FOR DEPOSITING DOPED AND UNDOPED GLASSY CHALCOGENIDE FILMS AT SUBSTANTIALLY ATMOSPHERIC PRESSURE

    METHOD AND APPARATUS FOR DEPOSITING DOPED AND UNDOPED GLASSY CHALCOGENIDE FILMS AT SUBSTANTIALLY ATMOSPHERIC PRESSURE von PETER D. FISHER, JAMES C. WORD, HADEN J. BOURG JR

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  2. 2
    Crater prevention technique for semiconductor processing

    Crater prevention technique for semiconductor processing von MCNELIS, JIM A, WEILER, PETER, BOURG, JR, HADEN J

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  3. 3
    Crater prevention technique for semiconductor processing

    Crater prevention technique for semiconductor processing von MCNELIS, JIM A, WEILER, PETER, BOURG, JR., HADEN J

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