Flexible yet impermeable composites with wrinkle structured BNNSs assembling for high-performance thermal management von Guo, Guilei, Liu, Yijie, Ding, Yafei, Liu, Wenjie, Zhu, Guimei, Hao, Xiaoli, Huang, Xingyi, Xia, Jianfei, Li, Baowen, Zhang, Tong-Yi, Sun, Bin

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Highly stretchable GR/TPU strain sensor based on one-step electrospun fibrous yarns for wearable devices von Xing, Lei, Li, Linze, Liu, Yu, Ren, Junyi, Guo, Guilei, Chen, Yifan, Zheng, Yu, Sun, Bin

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Study on instability mechanism of KCl/PHPA drilling waste fluid von Guo, Xiaoxuan, Li, Bin, Zhang, Guilei, Yan, Haiyuan, Li, Wei, Fan, Zhenzhong, Tong, Qilei

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Undoped Strained Ge Quantum Well with Ultrahigh Mobility of Two Million von Kong, Zhenzhen, Li, Zonghu, Cao, Gang, Su, Jiale, Zhang, Yiwen, Liu, Jinbiao, Liu, Jingxiong, Ren, Yuhui, Li, Huihui, Wei, Laiming, Guo, Guo-ping, Wu, Yuanyuan, Radamson, Henry H., Li, Junfeng, Wu, Zhenhua, Li, Hai-ou, Yang, Jiecheng, Zhao, Chao, Ye, Tianchun, Wang, Guilei

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Recent progress of flexible pressure sensors: from principle, structure to application characteristics von Liu, Shimin, Liu, Guilei, Qiu, Jianlong, Yang, Lei, Guo, Yanjie

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High Performance p-i-n Photodetectors on Ge-on-Insulator Platform von Zhao, Xuewei, Wang, Guilei, Lin, Hongxiao, Du, Yong, Luo, Xue, Kong, Zhenzhen, Su, Jiale, Li, Junjie, Xiong, Wenjuan, Miao, Yuanhao, Li, Haiou, Guo, Guoping, Radamson, Henry H.

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Integration of highly-strained SiGe materials in 14 nm and beyond nodes FinFET technology von Wang, Guilei, Abedin, Ahmad, Moeen, Mahdi, Kolahdouz, Mohammadreza, Luo, Jun, Guo, Yiluan, Chen, Tao, Yin, Huaxiang, Zhu, Huilong, Li, Junfeng, Zhao, Chao, Radamson, Henry H.

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Synthesis of polymorphic titanium oxide nanoparticles by a rapid gas-phase chemical reaction von Luo, Ning, Jing, Hong Wen, Ma, Zhan Guo, Liu, Weidong, Zhang, Liangchi, Sun, Guilei

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Ultrashallow heavily constrained quantum wells: The cradle for fully electrically controlled and microwave coupled quantum bits von Zhang, Yiwen, Li, Zonghu, Zhou, Yuchen, Ren, Yuhui, Ke, Jiahan, Su, Jiale, Song, Yanpeng, Deng, Jun, Liu, Yang, Zhang, Runze, Li, Haiou, Wang, Baochuan, Wu, Zhenhua, Luo, Jun, Kong, Zhenzhen, Cao, Gang, Guo, Guoping, Zhao, Chao, Wang, Guilei

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Effects of carbon pre-germanidation implant into Ge on the thermal stability of NiGe films von Liu, Qingbo, Wang, Guilei, Guo, Yiluan, Ke, Xingxing, Radamson, Henry, Liu, Hong, Zhao, Chao, Luo, Jun

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Optimization of a two-step Ni(5% Pt) germanosilicidation process and the redistribution of Pt in Ni(Pt)Si1−xGex germanosilicide von Liu, Qingbo, Wang, Guilei, Guo, Yiluan, Ke, Xingxing, Liu, Hong, Zhao, Chao, Luo, Jun

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Simulation and characterization of stress in FinFETs using novel LKMC and nanobeam diffraction methods von 郭奕栾 王桂磊 赵超 罗军

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Optimization of a two-step Ni(5% Pt) germanosilicidation process and the redistribution of Pt in Ni(Pt)Si1−Ge germanosilicide von Liu, Qingbo, Wang, Guilei, Guo, Yiluan, Ke, Xingxing, Liu, Hong, Zhao, Chao, Luo, Jun

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Optimization of a two-step Ni(5% Pt) germanosilicidation process and the redistribution of Pt in Ni(Pt)Si sub(1-x)Ge sub(x) germanosilicide von Liu, Qingbo, Wang, Guilei, Guo, Yiluan, Ke, Xingxing, Liu, Hong, Zhao, Chao, Luo, Jun

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Synthesis of polymorphic titanium oxide nanoparticles by a rapid gas-phase chemical reaction von Luo, Ning, Jing, Hong Wen, Ma, Zhan Guo, Liu, Weidong, Zhang, Liangchi, Sun, Guilei

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Simulation and characterization of stress in FinFETs using novel LKMC and nanobeam diffraction methodsProject supported by the "National S&T Major Project 02", the Opening Project... von Guo, Yiluan, Wang, Guilei, Zhao, Chao, Luo, Jun

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Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22 nm node pMOSFETs von Wang, G., Moeen, Mahdi, Abedin, Ahmad, Xu, Y., Luo, J., Guo, Y., Qin, C., Tang, Z., Yin, H., Li, J., Yan, J., Zhu, H., Zhao, C., Chen, D., Ye, T., Kolahdouz, M., Radamson, Henry H.

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Integration of highly-strained SiGe materials in 14nm and beyond nodes FinFET technology von Wang, Guilei, Abedin, Ahmad, Moeen, Mahdi, Kolahdouz, Mohammadreza, Luo, Jun, Guo, Yiluan, Chen, Tao, Yin, Huaxiang, Zhu, Huilong, Li, Junfeng, Zhao, Chao, Radamson, Henry H.

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Impact of pattern dependency of SiGe layers grown selectively in source/drain on the performance of 22nm node pMOSFETs von Wang, Guilei, Moeen, M., Abedin, A., Xu, Yefeng, Luo, Jun, Guo, Yiluan, Qin, Changliang, Tang, Zhaoyun, Yin, Haizhou, Li, Junfeng, Yan, Jiang, Zhu, Huilong, Zhao, Chao, Chen, Dapeng, Ye, Tianchun, Kolahdouz, M., Radamson, Henry H.

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Integration Issue of Tensile SiN Liner for Dual Stress Liner(DSL) in Gate-Last High-k/Metal Gate(HKMG) Process Flow von Qin, Changliang, Yin, Haizhou, Yin, Huaxiang, Wang, Guilei, Hong, Peizhen, Yang, Tao, Lu, Yihong, Xu, Qiang, Zhao, Zhiguo, Cui, Huishan, Zhao, Chao

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