Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology von Guillaume, N.M.P., Allen, R.A., Cresswell, M.W., Lahti, M., Linholm, L.W., Zaghloul, M.E.

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Electrical linewidth test structures patterned in [100] silicon-on-insulator for use as CD standards von Cresswell, M.W., Bonevich, J.E., Allen, R.A., Guillaume, N.M.P., Giannuzzi, L.A., Everist, S.C., Murabito, C.E., Shea, P.J., Linholm, L.W.

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Extraction of sheet resistance from four-terminal sheet resistors replicated in monocrystalline films with nonplanar geometries von Cresswell, M.W., Guillaume, N.M.P., Lee, W.E., Allen, R.A., Guthrie, W.F., Ghoshtagore, R.N., Osborne, Z.E., Sullivan, N., Linholm, L.W.

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Comparison of sheet-resistance measurements obtained by standard and small-area four-point probing von Guillaume, N.M.P., Cresswell, M.W., Allen, R.A., Everist, S., Linholm, L.W.

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Extraction of sheet resistance from four-terminal sheet resistors replicated in monocrystalline films with non-planar geometries von Cresswell, M.W., Guillaume, N.M.P., Allen, R.A., Guthrie, W.F., Ghoshtagore, R.N., Owen, J.C. III, Osborne, Z., Sullivan, N., Linholm, L.W.

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