The same chemical state of carbon gives rise to two peaks in X-ray photoelectron spectroscopy von Greczynski, G., Hultman, L.

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X-ray photoelectron spectroscopy: Towards reliable binding energy referencing von Greczynski, G., Hultman, L.

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Reliable determination of chemical state in x-ray photoelectron spectroscopy based on sample-work-function referencing to adventitious carbon: Resolving the myth of apparent consta... von Greczynski, G., Hultman, L.

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Self-consistent modelling of X-ray photoelectron spectra from air-exposed polycrystalline TiN thin films von Greczynski, G., Hultman, L.

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X-ray photoelectron spectroscopy studies of Ti1-xAlxN (0 ≤ x ≤ 0.83) high-temperature oxidation: The crucial role of Al concentration von Greczynski, G., Hultman, L., Odén, M.

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In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopy von Greczynski, G., Hultman, L.

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Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiation von Greczynski, G., Hultman, L., Petrov, I.

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Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layers von Greczynski, G., Primetzhofer, D., Lu, J., Hultman, L.

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A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering von Greczynski, G., Lu, J., Jensen, J., Bolz, S., Kölker, W., Schiffers, Ch, Lemmer, O., Greene, J.E., Hultman, L.

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High Si content TiSiN films with superior oxidation resistance von Greczynski, G., Bakhit, B., Hultman, L., Odén, M.

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Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumption von Li, X., Bakhit, B., Johansson Jõesaar, M. P., Petrov, I., Hultman, L., Greczynski, G.

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Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres von Greczynski, G., Hultman, L.

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Role of Tin+ and Aln+ ion irradiation (n=1, 2) during Ti1-xAlxN alloy film growth in a hybrid HIPIMS/magnetron mode von Greczynski, G., Lu, J., Johansson, M.P., Jensen, J., Petrov, I., Greene, J.E., Hultman, L.

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Toward energy-efficient physical vapor deposition: Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiation von Li, X., Bakhit, B., Jõesaar, M.P. Johansson, Hultman, L., Petrov, I., Greczynski, G.

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Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditions von Pshyk, A.V., Petrov, I., Bakhit, B., Lu, J., Hultman, L., Greczynski, G.

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High-entropy transition metal nitride thin films alloyed with Al: Microstructure, phase composition and mechanical properties von Pshyk, A.V., Vasylenko, A., Bakhit, B., Hultman, L., Schweizer, P., Edwards, T.E.J., Michler, J., Greczynski, G.

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A simple model for non-saturated reactive sputtering processes von Nyberg, T., Högberg, H., Greczynski, G., Berg, S.

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Microstructure control of CrNx films during high power impulse magnetron sputtering von GRECZYNSKI, G, JENSEN, J, BÖHLMARK, J, HULTMAN, L

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Towards energy-efficient physical vapor deposition: Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heating von Li, X., Bakhit, B., Johansson Jõesaar, M.P., Petrov, I., Hultman, L., Greczynski, G.

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Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering von Greczynski, G., Jensen, J., Hultman, L.

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