Growth kinetics of low pressure chemically vapour deposited selective tungsten films in WF 6Si and WF 6H 2 systems von Turtsevich, A.S, Krasnitsky, V.Y, Granko, V.I, Lesnikova, V.P, Smal, I.V, Sarychev, O.E, Nalivaiko, O.Y, Kravtsov, S.V

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Growth kinetics of low pressure chemically vapour deposited selective tungsten films in WF6-Si and WF6-H2 systems von TURTSEVICH, A. S, KRASNITSKY, V. Y, GRANKO, V. I, LESNIKOVA, V. P, SMAL, I. V, SARYCHEV, O. E, NALIVAIKO, O. Y, KRAVTSOV, S. V

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