Orientation- and concentration-dependent surfactant adsorption on silicon in aqueous alkaline solutions: explaining the changes in the etch rate, roughness and undercutting for MEM... von Gosálvez, M A, Tang, B, Pal, P, Sato, K, Kimura, Y, Ishibashi, K

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Reliability assessment of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples von Gosálvez, M A, Pal, Prem, Ferrando, N, Sato, K

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An atomistic introduction to anisotropic etching von Gosálvez, M A, Sato, K, Foster, A S, Nieminen, R M, Tanaka, H

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Level set implementation for the simulation of anisotropic etching: application to complex MEMS micromachining von Montoliu, C, Ferrando, N, Gosálvez, M A, Cerdá, J, Colom, R J

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Evolutionary determination of kinetic Monte Carlo rates for the simulation of evolving surfaces in anisotropic etching of silicon von Xing, Y, Gosálvez, M A, Sato, K, Tian, M, Yi, H

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Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples von Gosálvez, M A, Pal, Prem, Ferrando, N, Hida, H, Sato, K

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Step flow-based cellular automaton for the simulation of anisotropic etching of complex MEMS structures von Xing, Y, Gosálvez, M A, Sato, K

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Faster and exact implementation of the continuous cellular automaton for anisotropic etching simulations von Ferrando, N, Gosálvez, M A, Cerdá, J, Gadea, R, Sato, K

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Etched profile control in anisotropic etching of silicon by TMAH+Triton von Pal, Prem, Gosálvez, M A, Sato, K

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Apparent activation energy during surface evolution by step formation and flow von Gosálvez, M A, Cheng, D, Nieminen, R M, Sato, K

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Faster simulations of step bunching during anisotropic etching: formation of zigzag structures on Si(1 1 0) von Gosálvez, M A, Xing, Y, Hynninen, T, Uwaha, M, Foster, A S, Nieminen, R M, Sato, K

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Evolutionary continuous cellular automaton for the simulation of wet etching of quartz von Ferrando, N, Gosálvez, M A, Colóm, R J

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Implementation and evaluation of the Level Set method: Towards efficient and accurate simulation of wet etching for microengineering applications von Montoliu, C., Ferrando, N., Gosálvez, M.A., Cerdá, J., Colom, R.J.

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Evidence for faster etching at the mask-substrate interface: atomistic simulation of complex cavities at the micron-/submicron-scale by the continuous cellular automaton von Gosálvez, M A, Ferrando, N, Fedoryshyn, Y, Leuthold, J, McPeak, K M

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Fabrication of novel microstructures based on orientation-dependent adsorption of surfactant molecules in a TMAH solution von Pal, Prem, Sato, K, Gosalvez, M A, Tang, B, Hida, H, Shikida, M

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Reconstructing the 3D etch rate distribution of silicon in anisotropic etchants using data from vicinal {1 0 0}, {1 1 0} and {1 1 1} surfaces von Gosálvez, M A, Pal, Prem, Sato, K

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Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces von Ferrando, N., Gosálvez, M.A., Cerdá, J., Gadea, R., Sato, K.

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Orientation-dependent surface morphology of crystalline silicon during anisotropic etching using a continuous cellular automaton von Xing, Y, Gosálvez, M A, Sato, K, Yi, H

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Atomistic mechanism for the macroscopic effects induced by small additions of surfactants to alkaline etching solutions von Gosálvez, M.A., Pal, P., Tang, B., Sato, K.

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Atomistic methods for the simulation of evolving surfaces von Gosálvez, M A, Xing, Y, Sato, K, Nieminen, R M

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