Development of 1 \text Quantum Hall Array Resistance Standards von Oe, Takehiko, Gorwadkar, Sucheta, Itatani, Taro, Kaneko, Nobu-Hisa

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New Design of Quantized Hall Resistance Array Device von Oe, Takehiko, Matsuhiro, K., Itatani, T., Gorwadkar, S., Kiryu, S., Kaneko, N.

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3.8 × 3.8 mm 2 compact piezoelectric resonant MEMS scanner using fork-shaped and ring-shaped actuators von Okamoto, Yuki, Nakashima, Rihachiro, Oda, Ryo, Gorwadkar, Sucheta, Takei, Yusuke, Okada, Hironao

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3.8 × 3.8 mm2 compact piezoelectric resonant MEMS scanner using fork-shaped and ring-shaped actuators von Okamoto, Yuki, Nakashima, Rihachiro, Oda, Ryo, Gorwadkar, Sucheta, Takei, Yusuke, Okada, Hironao

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Improvement of yield ratio of ohmic contact to GaAs/AlGaAs heterostructure by application of SiO2 protective layer von Oe, Takehiko, Matsuhiro, Kenjiro, Itatani, Taro, Gorwadkar, Sucheta, Kiryu, Syogo, Kaneko, Nobu-hisa

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Development of Quantum Hall Array Resistance Standards at NMIJ von Oe, T, Matsuhiro, K, Itatani, T, Gorwadkar, S, Kiryu, S, Kaneko, N

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Fabrication of Planar Gradiometers by Using Superconducting Integrated Circuit Technology von Maezawa, Masaaki, Ying, Liliang, Gorwadkar, Sucheta, Zhang, Guofeng, Wang, Hai, Kong, Xiangyan, Wang, Zhen, Xie, Xiaoming

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Improvement of yield ratio of ohmic contact to GaAs/AlGaAs heterostructure by application of SiO 2 protective layer von Oe, Takehiko, Matsuhiro, Kenjiro, Itatani, Taro, Gorwadkar, Sucheta, Kiryu, Syogo, Kaneko, Nobu‐hisa

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Fabrication of Nanometer-Scale Vertical Metal-Insulator-Metal Tunnel Junctions Using a Silicon-on-Insulator Substrate von Haraichi, Satoshi, Wada, Toshimi, Gorwadkar, Sucheta M., Ishii, Kenichi

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SiO2/c-Si bilayer electron-beam resist process for nano-fabrication von GORWADKAR, S. M, WADA, T, HARAICHI, S, HIROSHIMA, H, ISHI, K, KOMURO, M

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Development of the 1 MΩ Quantized Hall Array Device von Oe, Takehiko, Sucheta, Gorwadkar, Itatani, Taro, Kaneko, Nobu-Hisa

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Observation of Quantized Voltage Steps Using a Josephson Junction Array Driven by Optoelectronically Generated Pulses von Urano, C., Kaneko, N., Maezawa, M., Itatani, T., Gorwadkar, S., Saitou, H., Maeda, J., Kiryu, S.

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Patterning of 2-10 nanometer-scale plasma-polymerized organic films by atomic force microscope von VINOGRADOV, G. K, GORWADKAR, S, SENDA, K, MORITA, S

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1 MΩ集積化量子ホール素子の開発 von 大江, 武彦, Gorwadkar, Sucheta, 板谷, 太郎, 金子, 晋久

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Operation of Josephson Junctions With Current Pulses Generated by Triggering a Cold Photo Detector With an Optical Comb von Urano, C.., Kaneko, N.., Maezawa, M.., Gorwadkar, S.., Itatani, T.., Saitou, H.., Maeda, J.., Kiryu, S..

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Improvement in the sensitivity of PPMMA electron beam resist by S and F atom doping von Madhukar, Zambare, Suresh, Gosavi, Sucheta, Gorwadkar, Beena, Kuruvilla, Sulabha, Kulkarni, Gangal Shashikala, Gangal Shashikala

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Ultrafast Active Transmission Lines with Low- k Polyimide Integrated with Ultrafast Photoconductive Switches von Yagi, Shuichi, Itatani, Taro, Kawanami, Hitoshi, Gorwadkar, Sucheta, Uemura, Takayuki, Fukushima, Takafumi, Itatani, Hiroshi, Tomoi, Masao, Tacano, Munecazu

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Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy von Kuruvilla, Beena Annie, Zambre, Madhukar, Gosavi, Suresh, Gorwadkar, Sucheta, Datta, A., Gangal, S. A., Kulkarni, S. K.

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METHOD FOR FORMING POLYIMIDE PATTERN USING PHOTOSENSITIVE POLYIMIDE AND COMPOSITION FOR USE THEREIN von KOMURO, MASANORI, MATSUMOTO, SHUNICHI, ITATANI, HIROSHI, SAKAMOTO, TSUNENORI, GORWADKAR, SUCHETA, ITATANI, TAROU

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SiO 2 /c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication von Gorwadkar, Sucheta M., Wada, Toshimi, Haraichi, Satoshi, Hiroshima, Hiroshi, Kenichi Ishii, Kenichi Ishii, Masanori Komuro, Masanori Komuro

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