A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches von Gordon, R.G., Hausmann, D., Kim, E., Shepard, J.

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Structural basis for recognition of AT-rich DNA by unrelated xenogeneic silencing proteins von Gordon, Blair R.G, Li, Yifei, Cote, Atina, Weirauch, Matthew T, Ding, Pengfei, Hughes, Timothy R, Navarre, William Wiley, Xia, Bin, Liu, Jun

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Lsr2 is a nucleoid-associated protein that targets AT-rich sequences and virulence genes in Mycobacterium tuberculosis von Gordon, Blair R.G, Li, Yifei, Wang, Linru, Sintsova, Anna, van Bakel, Harm, Tian, Songhai, Navarre, William Wiley, Xia, Bin, Liu, Jun

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Lsr2 of Mycobacterium Represents a Novel Class of H-NS-Like Proteins von Gordon, Blair R G, Imperial, Robin, Wang, Linru, Navarre, William Wiley, Liu, Jun

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Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition von JIANHUA HU, GORDON, R. G

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Recursive evaluation of 3j and 6j coefficients von Schulten, K.

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Current plate velocities relative to the hotspots incorporating the NUVEL-1 global plate motion model von Gripp, Alice E., Gordon, Richard G.

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Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films von Fix, Renaud, Gordon, Roy G, Hoffman, David M

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Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films von Fix, Renaud, Gordon, Roy G, Hoffman, David M

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Atmospheric pressure chemical vapor deposition of titanium nitride from tetrakis (diethylamido) titanium and ammonia von MUSHER, J. N, GORDON, R. G

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Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors von Fix, Renaud M, Gordon, Roy G, Hoffman, David M

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Chemical Doping of Graphene Nanoribbon Field-Effect Devices von Yu-Ming Lin, Farmer, D.B., Tulevski, G.S., Sheng Xu, Gordon, R.G., Avouris, P.

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Kinetic modeling of the chemical vapor deposition of tin oxide from tetramethyltin and oxygen von Zawadzki, Anthony G, Giunta, Carmen J, Gordon, Roy G

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Chemical vapor deposition of titanium nitride at low temperatures von Kurtz, S.R., Gordon, R.G.

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Solution-phase reactivity as a guide to the low-temperature chemical vapor deposition of early-transition-metal nitride thin films von Fix, Renaud M, Gordon, Roy G, Hoffman, David M

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