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    Structure and optical properties of thin [Al.sub.2][O.sub.3] films deposited by the reactive ion-plasma sputtering method on GaAs substrates

    Structure and optical properties of thin [Al.sub.2][O.sub.3] films deposited by the reactive ion-plasma sputtering method on GaAs substrates von Seredin, P.V, Goloschapov, D.L, Lukin, A.N, Len'shin, A.S, Bondarev, A.D, Arsent'ev, I.N, Vavilova, L.S, Tarasov, I.S

    Veröffentlicht in Semiconductors (Woodbury, N.Y.)

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