Chemical vapor deposition of aluminum from methylpyrrolidine alane complex von Liu, Y., Overzet, L.J., Goeckner, M.J.

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Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries von Thamban, P. L. Stephan, Hosch, Jimmy, Goeckner, M. J.

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Understanding the synthesis of DEGVE pulsed plasmas for application to ultra thin biocompatible interfaces von Padron-Wells, G., Jarvis, Brandon C., Jindal, A.K., Goeckner, M.J.

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Surface kinetics with low ion energy bombardment in fluorocarbon plasmas von Nelson, C T, Sant, S P, Overzet, L J, Goeckner, M J

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Optical Observation of Nitrogen Propagation in Argon Plasma von Ogawa, D., Goeckner, M. J., Overzet, L. J.

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The effects on plasma properties of a current node on inductively coupled plasma sources von Srinivasan, S, Marquis, J, Pratti, L, Khater, M H, Goeckner, M J, Overzet, L J

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Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model von Sant, S. P., Nelson, C. T., Overzet, L. J., Goeckner, M. J.

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Collisional sheath dynamics von Sheridan, T. E., Goeckner, M. J.

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Electronegative Plasma Structure von Goeckner, M.J., Nelson, C.T., Overzet, L.J.

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Plasma doping for shallow junctions von Goeckner, M. J., Felch, S. B., Fang, Z., Lenoble, D., Galvier, J., Grouillet, A., Yeap, G. C.-F., Bang, D., Lin, M.-R.

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Role of chamber dimension in fluorocarbon based deposition and etching of SiO2 and its effects on gas and surface-phase chemistry von Joseph, E. A., Zhou, B.-S., Sant, S. P., Overzet, L. J., Goeckner, M. J.

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Saturation broadening of laser‐induced fluorescence from plasma ions von Goeckner, M. J., Goree, J., Sheridan, T. E.

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Monte Carlo simulation of ions in a magnetron plasma von Goeckner, M.J., Goree, J.A., Sheridan, T.E.

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Measurements of the presheath in an electron cyclotron resonance etching device von Meyer, J A, Kim, G -H, Goeckner, M J, Hershkowitz, N

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Electron distribution functions in a sputtering magnetron discharge von SHERIDAN, T. E, GOECKNER, M. J, GOREE, J

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Plasma-surface interactions von Goeckner, M J, Nelson, C T, Sant, S P, Jindal, A K, Joseph, E A, Zhou, B S, Padron-Wells, G, Jarvis, B, Pierce, R, Overzet, L J

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Modified gaseous electronics conference reference cell for the study of plasma-surface-gas interactions von Goeckner, M. J., Marquis, J. M., Markham, B. J., Jindal, A. K., Joseph, E. A., Zhou, B.-S.

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In situ Fourier transform infrared characterization of the plasma chemistry in varying pulsed cycles of a 1,3-butadiene discharge in an inductively coupled gaseous electronics conf... von Jindal, A. K., Prengler, A. J., Overzet, L. J., Goeckner, M. J.

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Electron confinement on magnetic field lines von Goeckner, M.J., Earle, G.D., Overzet, L.J., Maynard, J.C.

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Pressure dependence of ionization efficiency in sputtering magnetrons von SHERIDAN, T. E, GOECKNER, M. J, GOREE, J

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