Neutralization of hyperthermal Ne + on metal surfaces von Kutana, A., Gordon, M.J., Giapis, K.P.

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Electrowetting in Carbon Nanotubes von Chen, J. Y., Kutana, A., Collier, C. P., Giapis, K. P.

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Continuous Flow Ion Mobility Separation with Mass Spectrometric Detection Using a Nano-Radial Differential Mobility Analyzer at Low Flow Rates von Brunelli, N. A, Neidholdt, E. L, Giapis, K. P, Flagan, R. C, Beauchamp, J. L

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Charge-exchange mechanisms at the threshold for inelasticity in Ne + collisions with surfaces von Gordon, M. J., Mace, J., Giapis, K. P.

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Low-energy ion beamline scattering apparatus for surface science investigations von Gordon, M. J., Giapis, K. P.

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Plasma interactions with high aspect ratio patterned surfaces: ion transport, scattering, and the role of charging von Giapis, K.P, Hwang, G.S

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The role of mask charging in profile evolution and gate oxide degradation von Giapis, K.P., Hwang, G.S., Joubert, O.

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Aspect-ratio-dependent charging in high-density plasmas von Hwang, Gyeong S., Giapis, Konstantinos P.

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Pattern-Dependent Charging in Plasmas: Electron Temperature Effects von Hwang, Gyeong S., Giapis, Konstantinos P.

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Prediction of multiple-feature effects in plasma etching von Hwang, Gyeong S., Giapis, Konstantinos P.

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Pattern-dependent charging in plasmas von Hwang, G.S., Giapis, K.P.

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Effects of C incorporation on the luminescence properties of ZnSe grown by metalorganic chemical vapor deposition von Skromme, B.J., Liu, W., Jensen, K.F., Giapis, K.P.

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On the dependence of plasma-induced charging damage on antenna area von Hwang, G.S., Giapis, K.P.

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Electric field dependence of allowed and forbidden transitions in In0.53Ga0.47As/In0.52Al0.48As single quantum wells by room temperature modulation spectroscopy von DIMOULAS, A, LENG, J, GIAPIS, K. P, GEORGAKILAS, A, HALKIAS, G, CHRISTOU, A

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Electric field dependence of allowed and forbidden transitions in In 0.53Ga 0.47As/In 0.52Al 0.48As single quantum wells by room temperature modulation spectroscopy von Dimoulas, A., Leng, J., Giapis, K.P., Georgakilas, A., Halkias, G., Christou, A.

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Mechanism of charging damage during interlevel oxide deposition in high-density plasma tools von Hwang, G.S., Giapis, K.P.

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On the Link Between Electron Shadowing And Charging Damage von Gyeong S. Hwang, Giapis, K.P.

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Real-time, In Situ Monitoring Of Semiconductor Processing von Gottscho, R.A., Aydil, E.S., Giapis, K.P., Gregus, J.A., Euijoun Youn, Hayes, T.R., Vernon, M.F., Chakrabarti, U.K.

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The implications of technology scaling on plasma-induced damage von Suehle, J., Giapis, K., Sery, G., Eriguchi, K., Hook, T., Cheung, K.P.

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