Template fabrication schemes for step and flash imprint lithography von Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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Nano-imprint lithography: Templates, imprinting and wafer pattern transfer von Dauksher, W.J., Le, N.V., Ainley, E.S., Nordquist, K.J., Gehoski, K.A., Young, S.R., Baker, J.H., Convey, D., Mangat, P.S.

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Repair of step and flash imprint lithography templates von Dauksher, W. J., Nordquist, K. J., Le, N. V., Gehoski, K. A., Mancini, D. P., Resnick, D. J., Casoose, L., Bozak, R., White, R., Csuy, J., Lee, D.

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Fabrication of multi-tiered structures on step and flash imprint lithography templates von Johnson, S., Resnick, D.J., Mancini, D., Nordquist, K., Dauksher, W.J., Gehoski, K., Baker, J.H., Dues, L., Hooper, A., Bailey, T.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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Step and Flash Imprint Lithography Modeling and Process Development von Johnson, S., Burns, R., Kim, E. K., Schmid, G., Dicky, M., Meiring, J., Burns, S., Stacey, N., Wilson, C. G., Convey, D., Wei, Y., Fejes, P., Gehoski, K., Mancini, D., Nordquist, K., Dauksher, W. J., Resnick, D. J.

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Image placement issues for ITO-based step and flash imprint lithography templates von Nordquist, K. J., Ainley, E. S., Mancini, D. P., Dauksher, W. J., Gehoski, K. A., Baker, J., Resnick, D. J., Masnyj, Z., Mangat, P. J. S.

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Distortion and overlay performance of UV step and repeat imprint lithography von Choi, Jin, Nordquist, Kevin, Cherala, Ashuman, Casoose, Lester, Gehoski, Kathy, Dauksher, William J., Sreenivasan, S.V., Resnick, Douglas J.

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Effects of etch barrier densification on step and flash imprint lithography von Johnson, S., Burns, R., Kim, E. K., Dickey, M., Schmid, G., Meiring, J., Burns, S., Willson, C. G., Convey, D., Wei, Y., Fejes, P., Gehoski, K., Mancini, D., Nordquist, K., Dauksher, W. J., Resnick, D. J.

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Selective dry etch process for step and flash imprint lithography von Le, Ngoc V., Dauksher, William J., Gehoski, Kathy A., Resnick, Douglas J., Hooper, A.E., Johnson, Steve, Willson, Grant

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Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography von Cardinale, G. F., Skinner, J. L., Talin, A. A., Brocato, R. W., Palmer, D. W., Mancini, D. P., Dauksher, W. J., Gehoski, K., Le, N., Nordquist, K. J., Resnick, D. J.

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Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates von Mancini, D. P., Gehoski, K. A., Ainley, E., Nordquist, K. J., Resnick, D. J., Bailey, T. C., Sreenivasan, S. V., Ekerdt, J. G., Willson, C. G.

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Electrical characteristics of schottky barriers on 4H-SiC: The effects of barrier height nonuniformity von Skromme, B. J., Luckowski, E., Moore, K., Bhatnagar, M., Weitzel, C. E., Gehoski, T., Ganser, D.

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Oxidation-Induced Crystallographic Transformation in Heavily N-Doped 4H-SiC Wafers von Vetter, William M., Dudley, Michael, Gehoski, T., Poweleit, C.D., Palle, K., Moore, K., Skromme, B.J., Bryant, L.R.

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Fermi Level Pinning and Schottky Barrier Characteristics on Reactively Ion Etched 4H-SiC von Clemens, S., Gehoski, T., Resnick, D., Moore, K., Ganser, D., Luckowski, E., Skromme, B.J.

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Temperature Dependent Small- and Large-Signal Performance of 4H-SiC MESFET's von Weitzel, C., Chatham, T., Moore, K., Gehoski, T., Pond, L., Bhatnagar, M.

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Oxidation-induced crystallographic transformation in heavily N-doped 4H-SiC wafers von Skromme, B J, Palle, K, Poweleit, C D, Bryant, L R, Vetter, W M, Dudley, M, Moore, K, Gehoski, T

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